National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, China.
Opt Lett. 2013 Jun 15;38(12):2068-70. doi: 10.1364/OL.38.002068.
We present a x-ray microscopy technique based on structured illumination in a microscope that characterizes the size of the subresolution-limit features. The technique is effective for characterizing fine structures substantially beyond the Rayleigh resolution of the microscope. We carried out optical experiments to demonstrate the basic principle of this new technique. Experimental results show good agreement with theoretical predictions. This technique should find a wide range of important imaging applications with a feature size down to nanometer scale, such as oil and gas reservoir rocks, advanced composites, and functional nanodevices and materials.
我们提出了一种基于显微镜中结构照明的 X 射线显微镜技术，该技术可用于表征亚分辨率极限特征的大小。该技术对于在明显超过显微镜瑞利分辨率的情况下对精细结构进行有效表征是非常有效的。我们进行了光学实验以证明该新技术的基本原理。实验结果与理论预测吻合较好。这种技术应该会在具有纳米级特征尺寸的广泛成像应用中找到重要应用，例如油气储层岩石、先进复合材料以及功能纳米器件和材料。
