Schofield M A, Beleggia M, Zhu Y, Pozzi G
Brookhaven National Laboratory, Condensed Matter, Physics and Materials Science Department, Building 480, Upton, NY 11973, USA.
Ultramicroscopy. 2008 Jun;108(7):625-34. doi: 10.1016/j.ultramic.2007.10.015. Epub 2007 Nov 22.
We present results that characterize the performance and capabilities of the JEOL 2100F-LM electron microscope to carry out holography and quantitative magnetic imaging. We find the microscope is well-suited for studies of magnetic materials, or for semi-conductor dopant profiling, where a large hologram width ( approximately 1 microm) and fine fringe spacing ( approximately 1.5 nm) are obtained with good contrast ( approximately 20%). We present, as well, measurements of the spherical aberration coefficient Cs=(108.7+/-9.6)mm and minimum achievable focal step delta f=(87.6+/-1.4)nm for the specially designed long-focal-length objective lens of this microscope. Further, we detail experiments to accurately measure the optical parameters of the imaging system typical of conventional holography setup in a transmission electron microscope. The role played by astigmatic illumination in the hologram formation is also assessed with a wave-optical model, which we present and discuss. The measurements obtained for our microscope are used to simulate realistic holograms, which we compare directly to experimental holograms finding good agreement. These results indicate the usefulness of measuring these optical parameters to guide the optimization of the experimental setup for a given microscope, and to provide an additional degree of practical experimental possibility.
我们展示了表征JEOL 2100F-LM电子显微镜进行全息术和定量磁成像的性能及能力的结果。我们发现该显微镜非常适合用于磁性材料研究或半导体掺杂剂剖析,在此类研究中可获得较大的全息图宽度(约1微米)、精细的条纹间距(约1.5纳米)以及良好的对比度(约20%)。我们还给出了该显微镜专门设计的长焦距物镜的球差系数Cs = (108.7 ± 9.6)毫米以及可实现的最小焦步长δf = (87.6 ± 1.4)纳米的测量结果。此外,我们详细介绍了用于精确测量透射电子显微镜中传统全息术设置典型成像系统光学参数的实验。还用一个波光学模型评估了像散照明在全息图形成中所起的作用,我们展示并讨论了该模型。对我们的显微镜所获得的测量结果用于模拟实际的全息图,我们将其与实验全息图直接比较,发现吻合度良好。这些结果表明测量这些光学参数对于指导给定显微镜实验装置的优化以及提供额外程度的实际实验可能性是有用的。