Department of Chemistry, Wayne State University, Detroit, Michigan 48202, USA.
J Am Chem Soc. 2013 Aug 28;135(34):12588-91. doi: 10.1021/ja407014w. Epub 2013 Aug 16.
Treatment of MCl2 (M = Cu, Ni, Co, Fe, Mn, Cr) with 2 equiv of α-imino alkoxide salts K(RR'COCNtBu) (R = Me, tBu; R' = iPr, tBu) afforded M(RR'COCNtBu)2 or [Mn(RR'COCNtBu)2]2 in 9-75% yields. These complexes combine volatility and high thermal stability and have useful atomic layer deposition (ALD) precursor properties. Solution reactions between Ni, Co, and Mn complexes showed that BH3(NHMe2) can reduce all to metal powders. ALD growth of Ni, Co, Fe, and Cr films is demonstrated. Mn film growth may be possible, but the films oxidize completely upon exposure to air.
用 2 当量的 α-亚氨基醇盐盐 K(RR'COCNtBu)（R = Me，tBu；R' = iPr，tBu）处理 MCl2（M = Cu，Ni，Co，Fe，Mn，Cr），可得到产率为 9-75%的 M(RR'COCNtBu)2 或 [Mn(RR'COCNtBu)2]2。这些配合物兼具挥发性和高热稳定性，具有有用的原子层沉积（ALD）前体性质。Ni、Co 和 Mn 配合物之间的溶液反应表明 BH3(NHMe2)可以将它们全部还原成金属粉末。证明了 Ni、Co、Fe 和 Cr 薄膜的 ALD 生长。Mn 薄膜的生长可能是可行的，但薄膜在暴露于空气中时会完全氧化。
