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通过位错强化脆性半导体纳米线:原位力学测试的见解。

Strengthening brittle semiconductor nanowires through stacking faults: insights from in situ mechanical testing.

机构信息

School of Aerospace, Mechanical and Mechatronic Engineering, The University of Sydney , Sydney, New South Wales 2006, Australia.

出版信息

Nano Lett. 2013 Sep 11;13(9):4369-73. doi: 10.1021/nl402180k. Epub 2013 Sep 3.

Abstract

Quantitative mechanical testing of single-crystal GaAs nanowires was conducted using in situ deformation transmission electron microscopy. Both zinc-blende and wurtzite structured GaAs nanowires showed essentially elastic deformation until bending failure associated with buckling occurred. These nanowires fail at compressive stresses of ~5.4 GPa and 6.2 GPa, respectively, which are close to those values calculated by molecular dynamics simulations. Interestingly, wurtzite nanowires with a high density of stacking faults fail at a very high compressive stress of ~9.0 GPa, demonstrating that the nanowires can be strengthened through defect engineering. The reasons for the observed phenomenon are discussed.

摘要

采用原位变形透射电子显微镜对单晶 GaAs 纳米线进行了定量力学测试。纤锌矿和闪锌矿结构的 GaAs 纳米线在发生与屈曲相关的弯曲失效之前,表现出基本弹性变形。这些纳米线在约 5.4 和 6.2 GPa 的压缩应力下失效,这与分子动力学模拟计算的值接近。有趣的是,具有高密度位错的闪锌矿纳米线在非常高的约 9.0 GPa 的压缩应力下失效,表明可以通过缺陷工程来增强纳米线。讨论了观察到的现象的原因。

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