Zhang Leilei, Li Xing, Cheng Shaobo, Shan Chongxin
Henan Key Laboratory of Diamond Optoelectronic Materials and Devices, Key Laboratory of Material Physics, Ministry of Education, School of Physics and Microelectronics, Zhengzhou University, Zhengzhou 450052, China.
Materials (Basel). 2022 Mar 4;15(5):1917. doi: 10.3390/ma15051917.
III-V group nanomaterials with a narrow bandgap have been demonstrated to be promising building blocks in future electronic and optoelectronic devices. Thus, revealing the underlying structural evolutions under various external stimuli is quite necessary. To present a clear view about the structure-property relationship of III-V nanowires (NWs), this review mainly focuses on key procedures involved in the synthesis, fabrication, and application of III-V materials-based devices. We summarized the influence of synthesis methods on the nanostructures (NWs, nanodots and nanosheets) and presented the role of catalyst/droplet on their synthesis process through in situ techniques. To provide valuable guidance for device design, we further summarize the influence of structural parameters (phase, defects and orientation) on their electrical, optical, mechanical and electromechanical properties. Moreover, the dissolution and contact formation processes under heat, electric field and ionic water environments are further demonstrated at the atomic level for the evaluation of structural stability of III-V NWs. Finally, the promising applications of III-V materials in the energy-storage field are introduced.
具有窄带隙的III-V族纳米材料已被证明是未来电子和光电器件中有前景的构建块。因此,揭示各种外部刺激下潜在的结构演变是非常必要的。为了清晰地了解III-V族纳米线(NWs)的结构-性能关系,本综述主要关注基于III-V族材料的器件在合成、制造和应用中涉及的关键步骤。我们总结了合成方法对纳米结构(纳米线、纳米点和纳米片)的影响,并通过原位技术展示了催化剂/液滴在其合成过程中的作用。为了为器件设计提供有价值的指导,我们进一步总结了结构参数(相、缺陷和取向)对其电学、光学、机械和机电性能的影响。此外,还在原子水平上进一步展示了在热、电场和离子水环境下的溶解和接触形成过程,以评估III-V族纳米线的结构稳定性。最后,介绍了III-V族材料在储能领域的潜在应用。