Department of Micro- and Nanosciences, Aalto University, Tietotie 3, FI-02150 Espoo, Finland.
Nanotechnology. 2013 Oct 4;24(39):395202. doi: 10.1088/0957-4484/24/39/395202. Epub 2013 Sep 6.
Using single-layer CVD graphene, a complementary field effect transistor (FET) device is fabricated on the top of separated back-gates. The local back-gate control of the transistors, which operate with low bias at room temperature, enables highly tunable device characteristics due to separate control over electrostatic doping of the channels. Local back-gating allows control of the doping level independently of the supply voltage, which enables device operation with very low VDD. Controllable characteristics also allow the compensation of variation in the unintentional doping typically observed in CVD graphene. Moreover, both p-n and n-p configurations of FETs can be achieved by electrostatic doping using the local back-gate. Therefore, the device operation can also be switched from inverter to voltage controlled resistor, opening new possibilities in using graphene in logic circuitry.
使用单层 CVD 石墨烯,在分离的背栅顶部制造互补场效应晶体管 (FET) 器件。室温下低偏置工作的晶体管的局部背栅控制,由于对沟道的静电掺杂进行单独控制,因此可以实现高度可调的器件特性。局部背栅控制允许独立于电源电压控制掺杂水平,从而实现极低 VDD 的器件工作。可控特性还允许补偿 CVD 石墨烯中通常观察到的非故意掺杂的变化。此外,通过使用局部背栅进行静电掺杂,可以实现 FET 的 p-n 和 n-p 两种配置。因此,通过使用局部背栅还可以将器件的工作状态从反相器切换到电压控制电阻器,为在逻辑电路中使用石墨烯开辟了新的可能性。