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通过用金属(II)离子刻蚀氧化亚铜来制备空心金属氧化物纳米晶体:对基本驱动力的探讨。

Fabrication of hollow metal oxide nanocrystals by etching cuprous oxide with metal(II) ions: approach to the essential driving force.

机构信息

Korea Center for Artificial Photosynthesis, Department of Chemistry, Sogang University, Seoul, 121-742, Republic of Korea.

出版信息

Nanoscale. 2013 Nov 21;5(22):11227-33. doi: 10.1039/c3nr03626j. Epub 2013 Oct 1.

DOI:10.1039/c3nr03626j
PMID:24084833
Abstract

Hollow metal oxide nanocrystals were prepared by etching cuprous oxide with metal ions and were applied as photoelectrodes. As a hard template, polyvinylpyrrolidone stabilized cuprous oxide (PVP-Cu2O) and non-stabilized cuprous oxide (nPVP-Cu2O) were synthesized by a precipitation method. Hollow iron oxide and cobalt oxide nanocrystals with a truncated octahedral morphology were fabricated by an etching reaction with transition metal(II) ions (Fe(2+) or Co(2+)). In the etching reaction process, a cationic exchange reaction occurs between the divalent metal ion and Cu(+) due to the higher Lewis acidity. Facet selective etching of cuprous oxide has been observed during the ionic exchange reaction of Cu(+) and O(2-) ions in PVP-Cu2O complexes with transition metal(II) ions (Fe(2+) or Co(2+)) at the surface of a (110) facet. Amorphous states of hollow metal oxide products were annealed to form α-Fe2O3 (hematite) and Co3O4 and their crystal structure was examined with X-ray diffraction and HR-TEM. The optical absorption behavior of semiconductor nanocrystals was measured with UV-vis spectroscopy to define band gap energy. The hollow hematite structure has a 2.08 eV band gap and Co3O4 (Co(II,III) oxide) has a 1.80 eV indirect band gap. Using these hollow nanocrystals, a metal oxide monolayer film was fabricated with a secondary growth approach and was studied for its photocatalytic properties.

摘要

采用金属离子刻蚀法制备了空心金属氧化物纳米晶,并将其用作光电阳极。以聚维酮稳定的氧化亚铜(PVP-Cu2O)和非稳定的氧化亚铜(nPVP-Cu2O)为硬模板,通过沉淀法合成了空心氧化铁和氧化钴纳米晶,具有截角八面体形态。在刻蚀反应过程中,由于路易斯酸度较高,二价金属离子与 Cu(+) 之间发生阳离子交换反应。在 PVP-Cu2O 配合物中,Cu(+) 和 O(2-) 离子与过渡金属(II)离子(Fe(2+) 或 Co(2+))的离子交换反应会导致(110)晶面的铜(+)选择性刻蚀。采用 X 射线衍射和高分辨率透射电子显微镜(HR-TEM)对空心金属氧化物产物的非晶态进行退火,以形成α-Fe2O3(赤铁矿)和 Co3O4,并对其晶体结构进行了研究。通过紫外可见光谱测量半导体纳米晶的光吸收行为,以确定带隙能。空心赤铁矿结构的带隙为 2.08 eV,Co3O4(Co(II,III)氧化物)的间接带隙为 1.80 eV。采用这些空心纳米晶,通过二次生长法制备了金属氧化物单层膜,并研究了其光催化性能。

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