National Laboratory of Solid State Microstructures, School of Electronic Science and Engineering, National Center of Microstructures and Quantum Manipulation, Nanjing University, Nanjing 210093, China.
Nat Commun. 2013;4:2642. doi: 10.1038/ncomms3642.
Molybdenum disulphide is a novel two-dimensional semiconductor with potential applications in electronic and optoelectronic devices. However, the nature of charge transport in back-gated devices still remains elusive as they show much lower mobility than theoretical calculations and native n-type doping. Here we report a study of transport in few-layer molybdenum disulphide, together with transmission electron microscopy and density functional theory. We provide direct evidence that sulphur vacancies exist in molybdenum disulphide, introducing localized donor states inside the bandgap. Under low carrier densities, the transport exhibits nearest-neighbour hopping at high temperatures and variable-range hopping at low temperatures, which can be well explained under Mott formalism. We suggest that the low-carrier-density transport is dominated by hopping via these localized gap states. Our study reveals the important role of short-range surface defects in tailoring the properties and device applications of molybdenum disulphide.
二硫化钼是一种新型二维半导体,在电子和光电子器件中有潜在的应用。然而,背栅器件中的电荷输运性质仍然难以捉摸,因为它们的迁移率远低于理论计算和本征 n 型掺杂。在这里,我们报告了对少层二硫化钼输运性质的研究,结合透射电子显微镜和密度泛函理论。我们提供了直接的证据表明,二硫化钼中存在硫空位,在带隙内引入局域施主态。在低载流子密度下,输运在高温下表现为最近邻跳跃,在低温下表现为变程跳跃,这可以很好地用莫特理论解释。我们认为,低载流子密度输运主要是通过这些局域带隙态的跳跃来实现的。我们的研究揭示了短程表面缺陷在调控二硫化钼的性质和器件应用方面的重要作用。