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二维提拉法生长单晶二硫化钼。

Two-dimensional Czochralski growth of single-crystal MoS.

作者信息

Jiang He, Zhang Xiankun, Chen Kuanglei, He Xiaoyu, Liu Yihe, Yu Huihui, Gao Li, Hong Mengyu, Wang Yunan, Zhang Zheng, Zhang Yue

机构信息

Academy for Advanced Interdisciplinary Science and Technology, Key Laboratory of Advanced Materials and Devices for Post-Moore Chips Ministry of Education, State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing, P. R. China.

Beijing Advanced Innovation Center for Materials Genome Engineering, School of Materials Science and Engineering, Beijing Key Laboratory for Advanced Energy Materials and Technologies, University of Science and Technology Beijing, Beijing, P. R. China.

出版信息

Nat Mater. 2025 Feb;24(2):188-196. doi: 10.1038/s41563-024-02069-7. Epub 2025 Jan 10.

Abstract

Batch production of single-crystal two-dimensional (2D) transition metal dichalcogenides is one prerequisite for the fabrication of next-generation integrated circuits. Contemporary strategies for the wafer-scale high-quality crystallinity of 2D materials centre on merging unidirectionally aligned, differently sized domains. However, an imperfectly merged area with a translational lattice brings about a high defect density and low device uniformity, which restricts the application of the 2D materials. Here we establish a liquid-to-solid crystallization in 2D space that can rapidly grow a centimetre-scale single-crystal MoS domain with no grain boundaries. The large MoS single crystal obtained shows superb uniformity and high quality with an ultra-low defect density. A statistical analysis of field effect transistors fabricated from the MoS reveals a high device yield and minimal variation in mobility, positioning this FET as an advanced standard monolayer MoS device. This 2D Czochralski method has implications for fabricating high-quality and scalable 2D semiconductor materials and devices.

摘要

批量生产单晶二维(2D)过渡金属二硫属化物是制造下一代集成电路的一个先决条件。当代实现二维材料晶圆级高质量结晶度的策略集中在合并单向排列、不同尺寸的畴。然而,具有平移晶格的不完全合并区域会导致高缺陷密度和低器件均匀性,这限制了二维材料的应用。在此,我们在二维空间中建立了一种液 - 固结晶方法,该方法能够快速生长出厘米级的无晶界单晶MoS畴。所获得的大尺寸MoS单晶显示出极好的均匀性和高质量,缺陷密度超低。对由该MoS制成的场效应晶体管进行统计分析,结果表明器件成品率高且迁移率变化极小,这使得该场效应晶体管成为先进的标准单层MoS器件。这种二维提拉法对于制造高质量且可扩展的二维半导体材料和器件具有重要意义。

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