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界面诱导氢化外延石墨烯中的室温铁磁性。

Interface-induced room-temperature ferromagnetism in hydrogenated epitaxial graphene.

机构信息

Molecular Materials and Nanosystems, Eindhoven University of Technology, 5600 MB Eindhoven, Netherlands.

出版信息

Phys Rev Lett. 2013 Oct 18;111(16):166101. doi: 10.1103/PhysRevLett.111.166101. Epub 2013 Oct 16.

Abstract

We show ferromagnetic properties of hydrogen-functionalized epitaxial graphene on SiC. Ferromagnetism in such a material is not directly evident as it is inherently composed of only nonmagnetic constituents. Our results nevertheless show strong ferromagnetism with a saturation of 0.9μ(B)/hexagon projected area, which cannot be explained by simple magnetic impurities. The ferromagnetism is unique to hydrogenated epitaxial graphene on SiC, where interactions with the interfacial buffer layer play a crucial role. We argue that the origin of the observed ferromagnetism is governed by electron correlation effects of the narrow Si dangling bond states in the buffer layer exchange coupled to localized states in the hydrogenated graphene layer. This forms a quasi-three-dimensional ferromagnet with a Curie temperature higher than 300 K.

摘要

我们展示了碳化硅外延石墨烯的氢化后的铁磁性。由于这种材料本质上仅由非磁性成分组成,因此其铁磁性并不明显。然而,我们的结果表明其具有强烈的铁磁性,饱和磁矩为 0.9μ(B)/六边形投影面积,这不能用简单的磁性杂质来解释。这种铁磁性是碳化硅外延氢化石墨烯所特有的,其中与界面缓冲层的相互作用起着至关重要的作用。我们认为,观察到的铁磁性的起源是由缓冲层中狭窄的硅悬空键态的电子相关效应与氢化石墨烯层中的局域态交换耦合所控制的。这形成了一个准三维铁磁体,其居里温度高于 300 K。

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