Opt Lett. 2013 Oct 15;38(20):4252-5. doi: 10.1364/OL.38.004252.
We combine the concepts of dip-in and stimulated-emission-depletion-inspired optical lithography for the first time to fabricate three-dimensional (3D) nanostructures for photonics. For depletion of the photoinitiator ITX we employ a fiber-coupled laser diode at 639 nm wavelength. To demonstrate the performance of the experimental setup, we have fabricated 3D chiral layer-by-layer twisted woodpile structures with a lattice constant reduced by more than a factor of 2 compared to earlier results. The fabricated chiral photonic crystals serve as dual-band polarizers for circular polarization at visible and telecom wavelengths. Spectroscopic measurements agree well with scattering-matrix calculations.
我们首次将浸入式和受激发射损耗启发的光学光刻概念结合起来，用于制造用于光子学的三维（3D）纳米结构。为了耗尽光引发剂 ITX，我们使用波长为 639nm 的光纤耦合激光二极管。为了展示实验装置的性能，我们已经制造出具有比早期结果减小超过 2 倍的晶格常数的 3D 手性层层扭曲木堆结构。所制造的手性光子晶体可用作可见光和电信波长的圆偏振双频偏光器。光谱测量与散射矩阵计算吻合良好。
