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将孤立的钼(Mo)原子掺入双层外延在 4H-SiC(0001)上的石墨烯中。

Incorporating isolated molybdenum (Mo) atoms into bilayer epitaxial graphene on 4H-SiC(0001).

机构信息

Institute of Super-microstructure and Ultrafast Process in Advanced Materials, School of Physics and Electronics, The Central South University , Changsha, Hunan 410083, PR China.

出版信息

ACS Nano. 2014 Jan 28;8(1):970-6. doi: 10.1021/nn4057929. Epub 2013 Dec 23.

Abstract

The atomic structures and electronic properties of isolated Mo atoms in bilayer epitaxial graphene (BLEG) on 4H-SiC(0001) are investigated by low temperature scanning tunneling microscopy (LT-STM). LT-STM results reveal that isolated Mo dopants prefer to substitute C atoms at α-sites and preferentially locate between the graphene bilayers. First-principles calculations confirm that the embedding of single Mo dopants within BLEG is energetically favorable as compared to monolayer graphene. The calculated band structures show that Mo-incorporated BLEG is n-doped, and each Mo atom introduces a local magnetic moment of 1.81 μB into BLEG. Our findings demonstrate a simple and stable method to incorporate single transition metal dopants into the graphene lattice to tune its electronic and magnetic properties for possible use in graphene spin devices.

摘要

采用低温扫描隧道显微镜(LT-STM)研究了 4H-SiC(0001)上双层外延石墨烯(BLEG)中孤立钼原子的原子结构和电子特性。LT-STM 结果表明,孤立的 Mo 掺杂剂优先取代α位的 C 原子,并优先位于石墨烯双层之间。第一性原理计算证实,与单层石墨烯相比,单 Mo 掺杂剂嵌入 BLEG 在能量上是有利的。计算得到的能带结构表明,掺入 Mo 的 BLEG 是 n 型掺杂的,每个 Mo 原子向 BLEG 引入 1.81 μB 的局部磁矩。我们的研究结果表明,一种简单而稳定的方法可以将单个过渡金属掺杂剂掺入石墨烯晶格中,以调整其电子和磁性,从而可能用于石墨烯自旋器件。

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