Department of Physics, Columbia University, New York, NY 10027, USA.
Science. 2011 Aug 19;333(6045):999-1003. doi: 10.1126/science.1208759.
In monolayer graphene, substitutional doping during growth can be used to alter its electronic properties. We used scanning tunneling microscopy, Raman spectroscopy, x-ray spectroscopy, and first principles calculations to characterize individual nitrogen dopants in monolayer graphene grown on a copper substrate. Individual nitrogen atoms were incorporated as graphitic dopants, and a fraction of the extra electron on each nitrogen atom was delocalized into the graphene lattice. The electronic structure of nitrogen-doped graphene was strongly modified only within a few lattice spacings of the site of the nitrogen dopant. These findings show that chemical doping is a promising route to achieving high-quality graphene films with a large carrier concentration.
在单层石墨烯中,生长过程中的替代掺杂可用于改变其电子性质。我们使用扫描隧道显微镜、拉曼光谱学、X 射线光谱学和第一性原理计算来对在铜基底上生长的单层石墨烯中的单个氮掺杂原子进行了表征。单个氮原子被掺入作为石墨掺杂剂,并且每个氮原子上的额外电子的一部分被离域到石墨烯晶格中。氮掺杂石墨烯的电子结构仅在掺杂氮原子的位置的几个晶格间距内被强烈修饰。这些发现表明,化学掺杂是实现具有大载流子浓度的高质量石墨烯薄膜的有前途的途径。