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氧化锌与氧化石墨烯和还原氧化石墨烯缓冲层的光致发光研究。

Photoluminescence investigation about zinc oxide with graphene oxide & reduced graphene oxide buffer layers.

机构信息

Electronic Materials Research Laboratory, Key Laboratory of Ministry of Education, School of Electronic and Information Engineering, International Center for Dielectric Research, Xi'an Jiaotong University, Xi'an 710049, China.

Electronic Materials Research Laboratory, Key Laboratory of Ministry of Education, School of Electronic and Information Engineering, International Center for Dielectric Research, Xi'an Jiaotong University, Xi'an 710049, China.

出版信息

J Colloid Interface Sci. 2014 Feb 15;416:289-93. doi: 10.1016/j.jcis.2013.10.059. Epub 2013 Nov 8.

Abstract

ZnO with graphene oxide (GO-ZnO) & reduced graphene oxide (rGO-ZnO) buffer layers were fabricated. Photoluminescence (PL) properties of GO-ZnO and rGO-ZnO compositions induced by oxygen vacancies defects were investigated using photoluminescence spectroscopy. The results showed that blue emission is quenched while yellow-orange emissions from GO-ZnO and rGO-ZnO compositions are significantly increased as compared to that of ZnO films. In stark contrast to enhanced yellow-orange emissions, PL spectra show three sharp, discrete emissions that characterize the dominant optical active defect, which is the oxygen vacancies and extended oxygen vacancies. Our results highlight the ability of GO & rGO buffer layers to modulate defect concentrations in ZnO and contribute to understanding the optical properties of deep-level defects, which is significant for development of long-wavelength photoelectric devices related with graphene materials.

摘要

制备了具有氧化石墨烯(GO-ZnO)和还原氧化石墨烯(rGO-ZnO)缓冲层的 ZnO。通过光致发光光谱研究了氧空位缺陷引起的 GO-ZnO 和 rGO-ZnO 复合材料的光致发光(PL)性质。结果表明,与 ZnO 薄膜相比,蓝色发射被猝灭,而 GO-ZnO 和 rGO-ZnO 复合材料的黄橙色发射显著增强。与增强的黄橙色发射形成鲜明对比的是,PL 光谱显示了三个尖锐的离散发射,其特征在于主要的光学活性缺陷,即氧空位和扩展氧空位。我们的结果突出了 GO 和 rGO 缓冲层在调节 ZnO 中缺陷浓度方面的能力,并有助于理解深能级缺陷的光学性质,这对于开发与石墨烯材料相关的长波长光电器件具有重要意义。

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