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嵌入和独立的硅纳米晶体中掺杂剂和共掺杂剂的优先定位。

Preferential positioning of dopants and co-dopants in embedded and freestanding Si nanocrystals.

机构信息

International School for Advanced Studies (SISSA) , via Bonomea 265, I-34136 Trieste, Italy.

出版信息

J Am Chem Soc. 2014 Mar 19;136(11):4404-9. doi: 10.1021/ja5002357. Epub 2014 Mar 4.

Abstract

In this work we aim at understanding the effect of n- and p-type substitutional doping in the case of matrix-embedded and freestanding Si nanocrystals. By means of ab initio calculations we identify the preferential positioning of the dopants and its effect on the structural properties with respect to the undoped case. Subsequently, we consider the case of phosphorus and boron co-doped nanocrystals showing that, against the single-doping situation, the energetics strongly favors the binding of the impurities at the nanocrystal surface. Indeed we demonstrate that the polar B-P bond forms a stable permanent electric dipole that radially points inward in the nanocrystal. Such a noteworthy characteristic and its physical consequences are discussed alongside new potential applications.

摘要

在这项工作中,我们旨在研究在基质嵌入和自由-standing Si 纳米晶的情况下 n 型和 p 型替位掺杂的影响。通过从头计算,我们确定了掺杂剂的优先定位及其对结构性质的影响相对于未掺杂的情况。随后,我们考虑了磷和硼共掺杂纳米晶的情况,表明与单掺杂情况相比,能量学强烈有利于杂质在纳米晶表面的结合。事实上,我们证明了极性 B-P 键形成了一个稳定的永久电偶极子,在纳米晶中径向指向内部。我们讨论了这种值得注意的特性及其物理后果,以及新的潜在应用。

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