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用于原位椭偏测量的窗口大双折射效应的校正。

Correction of large birefringent effect of windows for in situ ellipsometry measurements.

作者信息

Jin Lianhua, Kondoh Eiichi

出版信息

Opt Lett. 2014 Mar 15;39(6):1549-52. doi: 10.1364/OL.39.001549.

DOI:10.1364/OL.39.001549
PMID:24690835
Abstract

To extract true optical properties of samples in a chamber with entrance and exit optical windows, oftentimes the windows were approximated as simple retarders where the retardation was small and premeasured under a given condition. The proposed method allows to cope with large birefringent effect of chamber windows thanks to its capability of extracting ellipsometric parameters (Δ, Ψ) of isotropic samples as well as measuring birefringent parameters (δ, θ) of each window separately and simultaneously. This method is, however, not valid for anisotropic samples. Ex situ results and extracted ellipsometric parameters results from in situ measurements of a silicon substrate and a SiO2 film thermally grown on the silicon substrate exhibited excellent agreement and provided significance of this method.

摘要

为了在具有入射和出射光学窗口的腔室中提取样品的真实光学特性,通常将窗口近似为简单的延迟器,其中延迟较小且在给定条件下预先测量。所提出的方法能够分别且同时提取各向同性样品的椭偏参数(Δ,Ψ)以及测量每个窗口的双折射参数(δ,θ),从而能够应对腔室窗口的大双折射效应。然而,该方法对各向异性样品无效。硅衬底以及在硅衬底上热生长的SiO₂ 薄膜的非原位结果和原位测量提取的椭偏参数结果显示出极好的一致性,并证明了该方法的重要性。

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