Dipartimento di Scienza dei Materiali, Università di Milano-Bicocca via R. Cozzi 55 20125 Milano, Italy.
Acc Chem Res. 2014 Nov 18;47(11):3233-41. doi: 10.1021/ar4002944. Epub 2014 May 14.
Very rarely do researchers use metal oxides in their pure and fully stoichiometric form. In most of the countless applications of these compounds, ranging from catalysis to electronic devices, metal oxides are either doped or defective because the most interesting chemical, electronic, optical, and magnetic properties arise when foreign components or defects are introduced in the lattice. Similarly, many metal oxides are diamagnetic materials and do not show a response to specific spectroscopies such as electron paramagnetic resonance (EPR) spectroscopy. However, doped or defective oxides may exhibit an interesting and informative paramagnetic behavior. Doped and defective metal oxides offer an expanding range of applications in contemporary condensed matter science; therefore researchers have devoted enormous effort to the understanding their physical and chemical properties. The interplay between experiment and computation is particularly useful in this field, and contemporary simulation techniques have achieved high accuracies with these materials. In this Account, we show how the direct comparison between spectroscopic experimental and computational data for some selected and relevant materials provides ways to understand and control these complex systems. We focus on the EPR properties and electronic transitions that arise from the presence of dopants and defects in bulk metal oxide materials. We analyze and compare the effect of nitrogen doping in TiO2 and ZnO (two semiconducting oxides) and MgO (a wide gap insulator) and examine the effect of oxygen deficiency in the semiconducting properties of TiO2-x, ZnO1-x, and WO3-x materials. We chose these systems because of their relevance in applications including photocatalysis, touch screens, electrodes in magnetic random access memories, and smart glasses. Density functional theory (DFT) provides the general computational framework used to illustrate the electronic structure of these systems. However, for a more accurate description of the oxide band gap and of the electron localization of the impurity states associated with dopants or defects, we resorted to the use of hybrid functionals (B3LYP), where a portion of exact exchange in the exchange-correlation functional partly corrects for the self-interaction error inherent in DFT. In many cases, the self-interaction correction is very important, and these results can lead to a completely different physical picture than that obtained using local or semilocal functionals. We analyzed the electronic transitions in terms of their transition energy levels, which provided a more accurate comparison with experimental spectroscopic data than Kohn-Sham eigenvalues. The effects of N-doping were similar among the three oxides that we considered. The nature of the impurity state is always localized at the dopant site, which may limit their application in photocatalytic processes. Photocatalytic systems require highly delocalized photoexcited carriers within the material to effectively trigger redox processes at the surface. The nature of the electronic states associated with the oxygen deficiency differed widely in the three investigated oxides. In ZnO1-x and WO3-x the electronic states resemble the typical F-centers in insulating oxides or halides, with the excess electron density localized at the vacancy site. However, TiO2 acts as a reducible oxide, and the removal of neutral oxygen atoms reduced Ti(4+) to Ti(3+).
研究人员很少在其纯态和完全化学计量的形式下使用金属氧化物。在这些化合物的无数应用中,从催化到电子器件,金属氧化物要么被掺杂要么有缺陷,因为当外来成分或缺陷引入晶格时,最有趣的化学、电子、光学和磁性性质就会出现。同样,许多金属氧化物是抗磁性材料,不会对电子顺磁共振(EPR)光谱等特定光谱学产生响应。然而,掺杂或有缺陷的氧化物可能表现出有趣且信息丰富的顺磁性行为。掺杂和有缺陷的金属氧化物在当代凝聚态物质科学中提供了广泛的应用;因此,研究人员投入了大量精力来理解它们的物理和化学性质。实验和计算之间的相互作用在该领域特别有用,并且当代模拟技术已经在这些材料上实现了高精度。在本专题介绍中,我们展示了如何通过对一些选定的和相关材料的光谱实验和计算数据进行直接比较,为理解和控制这些复杂系统提供了方法。我们重点介绍了在体金属氧化物材料中存在掺杂剂和缺陷时产生的 EPR 性质和电子跃迁。我们分析和比较了氮掺杂在 TiO2 和 ZnO(两种半导体氧化物)和 MgO(宽能隙绝缘体)中的影响,并研究了氧缺陷对 TiO2-x、ZnO1-x 和 WO3-x 材料半导体性质的影响。我们选择这些系统是因为它们在包括光催化、触摸屏、磁随机存取存储器中的电极和智能眼镜在内的应用中具有相关性。密度泛函理论(DFT)提供了用于说明这些系统电子结构的一般计算框架。然而,为了更准确地描述氧化物能带隙和与掺杂剂或缺陷相关的杂质态的电子局域化,我们采用了混合泛函(B3LYP),其中交换相关泛函中的一部分精确交换部分纠正了 DFT 中固有的自相互作用误差。在许多情况下,自相互作用校正非常重要,并且这些结果可能导致与使用局部或半局部泛函获得的完全不同的物理图像。我们根据跃迁能级分析了电子跃迁,这比 Kohn-Sham 本征值提供了更准确的实验光谱数据比较。氮掺杂在我们考虑的三种氧化物中的影响相似。杂质态的性质始终在掺杂剂位置局部化,这可能限制了它们在光催化过程中的应用。光催化系统需要在材料内高度离域的光激发载流子,以有效地在表面触发氧化还原过程。在三种研究氧化物中,与氧缺陷相关的电子态性质差异很大。在 ZnO1-x 和 WO3-x 中,电子态类似于绝缘氧化物或卤化物中的典型 F 中心,过剩电子密度局域在空位处。然而,TiO2 作为一种可还原氧化物,中性氧原子的去除将 Ti(4+)还原为 Ti(3+)。