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通过原位表面化学改性的负性嵌段共聚物光刻技术。

Negative-tone block copolymer lithography by in situ surface chemical modification.

机构信息

Center for Nanomaterials and Chemical Reactions, Institute for Basic Science (IBS), Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea.

出版信息

Small. 2014 Oct 29;10(20):4207-12. doi: 10.1002/smll.201400971. Epub 2014 Jun 10.

DOI:10.1002/smll.201400971
PMID:24912807
Abstract

Negative-tone block copolymer (BCP) lithography based on in situ surface chemical modification is introduced as a highly efficient, versatile self-assembled nanopatterning. BCP blends films consisting of end-functionalized low molecular weight poly(styrene-ran-methyl methacrylate) and polystyrene-block-Poly(methyl methacylate) can produce surface vertical BCP nanodomains on various substrates without prior surface chemical treatment. Simple oxygen plasma treatment is employed to activate surface functional group formation at various substrates, where the end-functionalized polymers can be covalently bonded during the thermal annealing of BCP thin films. The covalently bonded brush layer mediates neutral interfacial condition for vertical BCP nanodomain alignment. This straightforward approach for high aspect ratio, vertical self-assembled nanodomain formation facilitates single step, site-specific BCP nanopatterning widely useful for various substrates. Moreover, this approach is compatible with directed self-assembly approaches to produce device oriented laterally ordered nanopatterns.

摘要

基于原位表面化学改性的负性嵌段共聚物 (BCP) 光刻技术被引入作为一种高效、通用的自组装纳米图案化方法。由端功能化的低分子量聚苯乙烯-甲基丙烯酸甲酯嵌段共聚物和聚苯乙烯-聚甲基丙烯酸甲酯嵌段共聚物组成的 BCP 共混膜可以在各种基底上产生表面垂直的 BCP 纳米区,而无需预先进行表面化学处理。简单的氧气等离子体处理用于在各种基底上激活表面功能基团的形成,其中端功能化聚合物可以在 BCP 薄膜的热退火过程中发生共价键合。共价键合的刷层介导垂直 BCP 纳米区对准的中性界面条件。这种用于高纵横比、垂直自组装纳米区形成的直截了当的方法促进了单步、定点 BCP 纳米图案化,广泛适用于各种基底。此外,这种方法与定向自组装方法兼容,可产生面向器件的横向有序纳米图案。

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