Shin Jin Yong, Oh Young Taek, Kim Simon, Lim Hoe Yeon, Lee Bom, Ko Young Chun, Park Shin, Seon Seung Won, Lee Se Gi, Mun Seung Soo, Kim Bong Hoon
Department of Organic Materials and Fiber Engineering, Soongsil University 369 Sangdo-ro, Dongjak-gu, Seoul 06978, Korea.
Department of Smart Wearable Engineering, Soongsil University 369 Sangdo-ro, Dongjak-gu, Seoul 06978, Korea.
Polymers (Basel). 2021 Feb 13;13(4):553. doi: 10.3390/polym13040553.
We study the orientation and ordering of nanodomains of a thickness-modulated lamellar block copolymer (BCP) thin film at each thickness region inside a topological nano/micropattern of bare silicon wafers without chemical pretreatments. With precise control of the thickness gradient of a BCP thin film and the width of a bare silicon trench, we successfully demonstrate (i) perfectly oriented lamellar nanodomains, (ii) pseudocylindrical nanopatterns as periodically aligned defects from the lamellar BCP thin film, and (iii) half-cylindrical nanostructure arrays leveraged by a trench sidewall with the strong preferential wetting of the PMMA block of the BCP. Our strategy is simple, efficient, and has an advantage in fabricating diverse nanopatterns simultaneously compared to conventional BCP lithography utilizing chemical pretreatments, such as a polymer brush or a self-assembled monolayer (SAM). The proposed self-assembly nanopatterning process can be used in energy devices and biodevices requiring various nanopatterns on the same device and as next-generation nanofabrication processes with minimized fabrication steps for low-cost manufacturing techniques.
我们研究了未经化学预处理的裸硅晶片拓扑纳米/微图案内每个厚度区域的厚度调制层状嵌段共聚物（BCP）薄膜纳米域的取向和有序性。通过精确控制BCP薄膜的厚度梯度和裸硅沟槽的宽度，我们成功证明了：（i）完美取向的层状纳米域；（ii）作为层状BCP薄膜周期性排列缺陷的伪圆柱形纳米图案；（iii）利用沟槽侧壁与BCP的PMMA嵌段的强优先润湿性形成的半圆柱形纳米结构阵列。与利用化学预处理（如聚合物刷或自组装单层（SAM））的传统BCP光刻相比，我们的策略简单、高效，并且在同时制造多种纳米图案方面具有优势。所提出的自组装纳米图案化工艺可用于在同一器件上需要各种纳米图案的能量器件和生物器件，以及作为具有最少制造步骤的下一代纳米制造工艺，以实现低成本制造技术。
