Yakovlev Sergey, Balsara Nitash P, Downing Kenneth H
Materials Sciences Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA.
Life Sciences Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA.
Membranes (Basel). 2013 Dec 16;3(4):424-39. doi: 10.3390/membranes3040424.
Nafion is one of the most common materials used for polyelectrolyte membranes and is the standard to which novel materials are compared. In spite of great interest in Nafion's nanostructure, it is still a subject of controversy. While multiple research efforts have addressed Nafion's morphology with Transmission Electron Microscopy, the results of these efforts have often been inconsistent and cannot satisfactorily describe the membrane structure. One of the reasons for differences in the reported results is the lack of sufficient control over the damage caused by electron beam irradiation. In this work, we describe some aspects of damage in the material that have a strong influence on the results. We show that irradiation causes mass loss and phase separation in the material and that the morphologies that have been observed are, in many cases, artifacts caused by damage. We study the effect of the sample temperature on damage and show that, while working at low temperature does not prevent damage and mass loss, it slows formation of damage-induced artifacts to the point where informative low-dose images of almost undamaged material may be collected. We find that charging of the sample has a substantial effect on the damage, and the importance of charge neutralization under irradiation is also seen by the large reduction of beam induced movement with the use of an objective aperture or a conductive support film. To help interpret the low-dose images, we can apply slightly higher exposures to etch away the hydrophobic phase with the electron beam and reveal the network formed by the hydrophilic phase. Energy loss spectroscopy shows evidence that fluorine removal governs the beam damage process.
纳滤膜是用于聚电解质膜的最常见材料之一,也是用于比较新型材料的标准。尽管人们对纳滤膜的纳米结构非常感兴趣,但它仍然是一个有争议的话题。虽然多项研究工作已经用透射电子显微镜研究了纳滤膜的形态,但这些研究结果往往不一致,无法令人满意地描述膜结构。报告结果存在差异的一个原因是对电子束辐照造成的损伤缺乏足够的控制。在这项工作中,我们描述了材料中对结果有重大影响的一些损伤方面。我们表明,辐照会导致材料质量损失和相分离,而且在许多情况下,观察到的形态是由损伤引起的伪像。我们研究了样品温度对损伤的影响,结果表明,虽然在低温下工作并不能防止损伤和质量损失,但它会减缓损伤诱导伪像的形成,以至于可以收集到几乎未受损材料的低剂量信息图像。我们发现样品充电对损伤有很大影响,并且通过使用物镜光阑或导电支撑膜大大减少束诱导移动,也可以看出辐照下电荷中和的重要性。为了帮助解释低剂量图像,我们可以稍微增加曝光量,用电子束蚀刻掉疏水相,揭示亲水相形成的网络。能量损失谱表明,氟的去除控制着束损伤过程。