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Si-nanowire-based multistage delayed Mach-Zehnder interferometer optical MUX/DeMUX fabricated by an ArF-immersion lithography process on a 300 mm SOI wafer.

作者信息

Jeong Seok-Hwan, Shimura Daisuke, Simoyama Takasi, Horikawa Tsuyoshi, Tanaka Yu, Morito Ken

出版信息

Opt Lett. 2014 Jul 1;39(13):3702-5. doi: 10.1364/OL.39.003702.

DOI:10.1364/OL.39.003702
PMID:24978715
Abstract

We report good phase controllability and high production yield in Si-nanowire-based multistage delayed Mach-Zehnder interferometer-type optical multiplexers/demultiplexers (MUX/DeMUX) fabricated by an ArF-immersion lithography process on a 300 mm silicon-on-insulator (SOI) wafer. Three kinds of devices fabricated in this work exhibit clear 1×4 Ch wavelength filtering operations for various optical frequency spacing. These results are promising for their applications in high-density wavelength division multiplexing-based optical interconnects.

摘要

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