Chidambaram Nachiappan, Mazzalai Andrea, Balma Davide, Muralt Paul
IEEE Trans Ultrason Ferroelectr Freq Control. 2013 Aug;60(8):1564-71. doi: 10.1109/TUFFC.2013.2736.
Lead zirconate titanate (PZT) thin films on insulator- buffered silicon substrates with interdigitated electrodes (IDEs) have the potential to harvest more energy than parallel plate electrode (PPE) structures because the former exploit the longitudinal piezoelectric effect, which is about twice as high as the transverse piezoelectric effect used by PPE structures. In this work, both options are compared with respect to dielectric, ferroelectric, and piezoelectric properties, leakage currents, and figure of merit (FOM) for energy harvesting. The test samples were silicon beams with {100} PZT thin films in the case of the PPE geometry, and random PZT thin films for the IDE geometry. Both films were obtained by an identical sol-gel route. Almost the same dielectric constants were derived when the conformal mapping method was applied for the IDE capacitor to correct for the IDE geometry. The dielectric loss was smaller in the IDE case. The ferroelectric loops showed a higher saturation polarization, a higher coercive field, and less back-switching for the IDE case. The leakage current density of the IDE structure was measured to be about 4 orders of magnitude lower than that of the PPE structure. The best FOM of the IDE structures was 20% superior to that of the PPE structures while also having a voltage response that was ten times higher (12.9 mV/μ strain).
在带有叉指电极(IDE)的绝缘体缓冲硅衬底上的锆钛酸铅(PZT)薄膜,比平行板电极(PPE)结构有潜力收集更多能量,因为前者利用纵向压电效应,该效应约为PPE结构所使用的横向压电效应的两倍。在这项工作中,对这两种结构在介电、铁电和压电性能、漏电流以及能量收集品质因数(FOM)方面进行了比较。测试样品在PPE几何结构情况下是带有{100} PZT薄膜的硅梁,在IDE几何结构情况下是随机的PZT薄膜。两种薄膜均通过相同的溶胶 - 凝胶法制备。当对IDE电容器应用共形映射方法来校正IDE几何结构时,得到了几乎相同的介电常数。IDE情况下的介电损耗较小。铁电回线显示,IDE情况下具有更高的饱和极化、更高的矫顽场以及更少的反向切换。测量发现IDE结构的漏电流密度比PPE结构低约4个数量级。IDE结构的最佳FOM比PPE结构高20%,同时其电压响应高十倍(12.9 mV/μ应变)。