Kang Minji, Kim Yeong-A, Yun Jin-Mun, Khim Dongyoon, Kim Jihong, Noh Yong-Young, Baeg Kang-Jun, Kim Dong-Yu
Heeger Center for Advanced Materials, Gwangju Institute of Science and Technology (GIST), 261 Cheomdan-gwagiro, Buk-gu, Gwangju 500-712, Republic of Korea.
Nanoscale. 2014 Nov 7;6(21):12315-23. doi: 10.1039/c4nr03448a.
In this study, we investigated chemically exfoliated two-dimensional (2-D) nanoflakes of molybdenum disulfide (MoS2) as charge-storing elements for use in organic multilevel memory devices (of the printed/flexible non-volatile type) based on organic field-effect transistors (OFETs) containing poly(3-hexylthiophene) (P3HT). The metallic MoS2 nanoflakes were exfoliated in 2-methoxyethanol by the lithium intercalation method and were deposited as nano-floating gates between polystyrene and poly(methyl methacrylate), used as bilayered gate dielectrics, by a simple spin-coating and low temperature (<150 °C) process. In the developed OFET memory devices, electrons could be trapped/detrapped in the MoS2 nano-floating gates by modulating the charge carrier density in the active channel through gate bias control. Optimal memory characteristics were achieved by controlling the thickness and concentration of few-layered MoS2 nanoflakes, and the best device showed reliable non-volatile memory properties: a sufficient memory window of ∼23 V, programming-reading-erasing cycling endurance of >10(2) times, and most importantly, quasi-permanent charge-storing characteristics, i.e., a very long retention time (longer than the technological requirement of commercial memory devices (>10 years)). In addition, we successfully developed multilevel memory cells (2 bits per cell) by controlling the gate bias magnitude.
在本研究中,我们研究了化学剥离的二硫化钼(MoS₂)二维纳米片作为电荷存储元件,用于基于含有聚(3 - 己基噻吩)(P3HT)的有机场效应晶体管(OFET)的有机多层存储器件(印刷/柔性非易失性类型)。通过锂嵌入法在2 - 甲氧基乙醇中剥离出金属性MoS₂纳米片,并通过简单的旋涂和低温(<150°C)工艺,将其作为纳米浮栅沉积在用作双层栅极电介质的聚苯乙烯和聚(甲基丙烯酸甲酯)之间。在开发的OFET存储器件中,通过栅极偏置控制来调制有源沟道中的电荷载流子密度,电子可以在MoS₂纳米浮栅中被捕获/释放。通过控制少层MoS₂纳米片的厚度和浓度实现了最佳存储特性,最佳器件表现出可靠的非易失性存储性能:约23 V的足够存储窗口、>10²次的编程 - 读取 - 擦除循环耐久性,最重要的是,准永久电荷存储特性,即非常长的保留时间(长于商业存储器件的技术要求(>10年))。此外,我们通过控制栅极偏置幅度成功开发了多层存储单元(每个单元2位)。