School of Mechanical and Chemical Engineering, University of Western Australia, 35 Stirling Hwy, Crawley, Western Australia 6009, Australia ; School of Electrical, Electronic and Computer Engineering, University of Western Australia, 35 Stirling Hwy, Crawley, Western Australia 6009, Australia.
School of Mechanical and Chemical Engineering, University of Western Australia, 35 Stirling Hwy, Crawley, Western Australia 6009, Australia.
Nanoscale Res Lett. 2014 Aug 22;9(1):426. doi: 10.1186/1556-276X-9-426. eCollection 2014.
Suspended micromachined porous silicon beams with laterally uniform porosity are reported, which have been fabricated using standard photolithography processes designed for compatibility with complementary metal-oxide-semiconductor (CMOS) processes. Anodization, annealing, reactive ion etching, repeated photolithography, lift off and electropolishing processes were used to release patterned porous silicon microbeams on a Si substrate. This is the first time that micromachined, suspended PS microbeams have been demonstrated with laterally uniform porosity, well-defined anchors and flat surfaces.
81.16.-c; 81.16.Nd; 81.16.Rf.
本文报道了采用标准光刻工艺制造的具有侧向均匀孔隙率的悬浮微机械多孔硅梁，该工艺设计与互补金属氧化物半导体（CMOS）工艺兼容。采用电化学腐蚀、退火、反应离子刻蚀、多次光刻、剥离和电化学抛光工艺在 Si 衬底上释放出图案化多孔硅微梁。这是首次展示具有侧向均匀孔隙率、明确定义的锚和平面的微机械悬浮 PS 微梁。
理 论 物 理 学 参 考 号：81.16.-c；81.16.Nd；81.16.Rf。
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