Department of Electronic Materials Engineering, Research School of Physics and Engineering, and ‡Centre of Advanced Microscopy, The Australian National University , Canberra, ACT 0200, Australia.
Nano Lett. 2014 Oct 8;14(10):5865-72. doi: 10.1021/nl5027937. Epub 2014 Sep 22.
With increasing interest in nanowire-based devices, a thorough understanding of the nanowire shape is required to gain tight control of the quality of nanowire heterostructures and improve the performance of related devices. We present a systematic study of the sidewalls of Au-catalyzed GaAs nanowires by investigating the faceting process from the beginning with vapor-liquid-solid (VLS) nucleation, followed by the simultaneous radial growth on the sidewalls, and to the end with sidewall transformation during annealing. The VLS nucleation interface of our GaAs nanowires is revealed by examining cross sections of the nanowire, where the nanowire exhibits a Reuleaux triangular shape with three curved surfaces along {112}A. These curved surfaces are not thermodynamically stable and adopt {112}A facets during radial growth. We observe clear differences in radial growth rate between the ⟨112⟩A and ⟨112⟩B directions with {112}B facets forming due to the slower radial growth rate along ⟨112⟩B directions. These sidewalls transform to {110} facets after high temperature (>500 °C) annealing. A nucleation model is proposed to explain the origin of the Reuleaux triangular shape of the nanowires, and the sidewall evolution is explained by surface kinetic and thermodynamic limitations.
随着对基于纳米线的器件的兴趣日益增加,需要深入了解纳米线的形状,以便对纳米线异质结构的质量进行严格控制,并提高相关器件的性能。我们通过研究 VLS 成核过程中的晶面形成过程,对 Au 催化的 GaAs 纳米线的侧壁进行了系统研究,该过程从 VLS 成核开始,然后是侧壁的同时径向生长,最后是退火过程中的侧壁转变。通过检查纳米线的横截面,揭示了我们的 GaAs 纳米线的 VLS 成核界面,纳米线呈现出具有三个沿 {112}A 曲线表面的 Reuleaux 三角形形状。这些曲面在热力学上不稳定,在径向生长过程中采用 {112}A 晶面。我们观察到 ⟨112⟩A 和 ⟨112⟩B 方向之间的径向生长速率存在明显差异,由于 ⟨112⟩B 方向的径向生长速率较慢,因此形成了 {112}B 晶面。这些侧壁在高温(>500°C)退火后转变为 {110} 晶面。提出了一种成核模型来解释纳米线的 Reuleaux 三角形形状的起源,并且通过表面动力学和热力学限制来解释侧壁演变。