Windt David L, Donguy Soizik, Hailey Charles J, Koglin Jason, Honkimaki Veijo, Ziegler Eric, Christensen Finn E, Chen Hubert, Harrison Fiona A, Craig William W
Columbia Astrophysics Laboratory, 550 West 120 Street, New York, New York 10027, USA.
Appl Opt. 2003 May 1;42(13):2415-21. doi: 10.1364/ao.42.002415.
We have developed a new depth-graded multilayer system comprising W and SiC layers, suitable for use as hard x-ray reflective coatings operating in the energy range 100-200 keV. Grazing-incidence x-ray reflectance at E = 8 keV was used to characterize the interface widths, as well as the temporal and thermal stability in both periodic and depth-graded W/SiC structures, whereas synchrotron radiation was used to measure the hard x-ray reflectance of a depth-graded multilayer designed specifically for use in the range E approximately 150-170 keV. We have modeled the hard x-ray reflectance using newly derived optical constants, which we determined from reflectance versus incidence angle measurements also made using synchrotron radiation, in the range E = 120-180 keV. We describe our experimental investigation in detail compare the new W/SiC multilayers with both W/Si and W/B4C films that have been studied previously, and discuss the significance of these results with regard to the eventual development of a hard x-ray nuclear line telescope.
我们已经开发出一种新的包含钨（W）和碳化硅（SiC）层的深度渐变多层系统，适用于用作在100 - 200 keV能量范围内工作的硬X射线反射涂层。利用E = 8 keV时的掠入射X射线反射率来表征界面宽度，以及周期性和深度渐变的W/SiC结构中的时间稳定性和热稳定性，而同步辐射则用于测量专门设计用于E约为150 - 170 keV范围内的深度渐变多层膜的硬X射线反射率。我们使用新推导的光学常数对硬X射线反射率进行了建模，这些光学常数是我们通过同样利用同步辐射在E = 120 - 180 keV范围内进行的反射率与入射角测量确定的。我们详细描述了我们的实验研究，将新的W/SiC多层膜与先前研究过的W/Si和W/B4C薄膜进行了比较，并讨论了这些结果对于硬X射线核线望远镜最终开发的意义。
