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结构特性对磁流变抛光KDP晶体表面粗糙度的影响规律

Influence law of structural characteristics on the surface roughness of a magnetorheological-finished KDP crystal.

作者信息

Chen Shaoshan, Li Shengyi, Hu Hao, Li Qi, Tie Guipeng

出版信息

Appl Opt. 2014 Nov 1;53(31):7215-23. doi: 10.1364/AO.53.007215.

Abstract

A new nonaqueous and abrasive-free magnetorheological finishing (MRF) method is adopted for processing potassium dihydrogen phosphate (KDP) crystal due to its low hardness, high brittleness, temperature sensitivity, and water solubility. This paper researches the influence of structural characteristics on the surface roughness of MRF-finished KDP crystal. The material removal by dissolution is uniform layer by layer when the polishing parameters are stable. The angle between the direction of the polishing wheel's linear velocity and the initial turning lines will affect the surface roughness. If the direction is perpendicular to the initial turning lines, the polishing can remove the lines. If the direction is parallel to the initial turning lines, the polishing can achieve better surface roughness. The structural characteristic of KDP crystal is related to its internal chemical bonds due to its anisotropy. During the MRF finishing process, surface roughness will be improved if the structural characteristics of the KDP crystal are the same on both sides of the wheel. The processing results of (001) plane crystal show we can get the best surface roughness (RMS of 0.809 nm) if the directions of cutting and MRF polishing are along the (110) direction.

摘要

由于磷酸二氢钾(KDP)晶体硬度低、脆性高、温度敏感且具有水溶性,因此采用一种新型的无水无磨料磁流变抛光(MRF)方法对其进行加工。本文研究了结构特性对MRF抛光KDP晶体表面粗糙度的影响。当抛光参数稳定时,溶解去除材料是逐层均匀进行的。抛光轮线速度方向与初始转向线之间的夹角会影响表面粗糙度。如果该方向垂直于初始转向线,则抛光可以去除这些线。如果该方向平行于初始转向线,则抛光可以获得更好的表面粗糙度。由于KDP晶体的各向异性,其结构特性与其内部化学键有关。在MRF抛光过程中,如果KDP晶体在抛光轮两侧的结构特性相同,则表面粗糙度会得到改善。(001)面晶体的加工结果表明,如果切割和MRF抛光方向沿(110)方向,则可以获得最佳表面粗糙度(均方根值为0.809纳米)。

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