Tileli Vasiliki, Duchamp Martial, Axelsson Anna-Karin, Valant Matjaz, Dunin-Borkowski Rafal E, Alford Neil McN
Department of Materials, Imperial College London, Exhibition Road, SW7 2AZ London, UK.
Nanoscale. 2015 Jan 7;7(1):218-24. doi: 10.1039/c4nr04339a.
The performance of complex oxide heterostructures depends primarily on the interfacial coupling of the two component structures. This interface character inherently varies with the synthesis method and conditions used since even small composition variations can alter the electronic, ferroelectric, or magnetic functional properties of the system. The focus of this article is placed on the interface character of a pulsed laser deposited CoFe2O4/BaTiO3 thin film. Using a range of state-of-the-art transmission electron microscopy methodologies, the roles of substrate morphology, interface stoichiometry, and cation intermixing are determined on the atomic level. The results reveal a surprisingly uneven BaTiO3 substrate surface formed after the film deposition and Fe atom incorporation in the top few monolayers inside the unit cell of the BaTiO3 crystal. Towards the CoFe2O4 side, a disordered region extending several nanometers from the interface was revealed and both Ba and Ti from the substrate were found to diffuse into the spinel layer. The analysis also shows that within this somehow incompatible composite interface, a different phase is formed corresponding to the compound Ba2Fe3Ti5O15, which belongs to the ilmenite crystal structure of FeTiO3 type. The results suggest a chemical activity between these two oxides, which could lead to the synthesis of complex engineered interfaces.
复杂氧化物异质结构的性能主要取决于两种组成结构的界面耦合。由于即使是很小的成分变化也会改变系统的电学、铁电或磁功能特性,这种界面特性本质上会随着合成方法和条件的不同而变化。本文的重点是脉冲激光沉积的CoFe2O4/BaTiO3薄膜的界面特性。使用一系列最先进的透射电子显微镜方法,在原子水平上确定了衬底形态、界面化学计量和阳离子混合的作用。结果显示,薄膜沉积后形成了一个令人惊讶的不均匀的BaTiO3衬底表面,并且在BaTiO3晶体的晶胞内顶层的几个单分子层中掺入了Fe原子。在靠近CoFe2O4一侧,发现从界面延伸数纳米的无序区域,并且衬底中的Ba和Ti都扩散到了尖晶石层中。分析还表明,在这个某种程度上不相容的复合界面内,形成了一种对应于化合物Ba2Fe3Ti5O15的不同相,该化合物属于FeTiO3型的钛铁矿晶体结构。结果表明这两种氧化物之间存在化学活性,这可能导致合成复杂的工程界面。