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二维二硫化钼原子层的合成与缺陷研究。

Synthesis and defect investigation of two-dimensional molybdenum disulfide atomic layers.

机构信息

Department of Materials Science and NanoEngineering, Rice University , Houston, Texas 77005, United States.

出版信息

Acc Chem Res. 2015 Jan 20;48(1):31-40. doi: 10.1021/ar500291j. Epub 2014 Dec 9.

Abstract

CONSPECTUS

The unique physical properties of two-dimensional (2D) molybdenum disulfide (MoS2) and its promising applications in future optoelectronics have motivated an extensive study of its physical properties. However, a major limiting factor in investigation of 2D MoS2 is its large area and high quality preparation. The existence of various types of defects in MoS2 also makes the characterization of defect types and the understanding of their roles in the physical properties of this material of critical importance. In this Account, we review the progress in the development of synthetic approaches for preparation of 2D MoS2 and the understanding of the role of defects in its electronic and optical properties. We first examine our research efforts in understanding exfoliation, direct sulfurization, and chemical vapor deposition (CVD) of MoS2 monolayers as main approaches for preparation of such atomic layers. Recognizing that a natural consequence of the synthetic approaches is the addition of sources of defects, we initially focus on identifying these imperfections with intrinsic and extrinsic origins in CVD MoS2. We reveal the predominant types of point and grain boundary defects in the crystal structure of polycrystalline MoS2 using transmission electron microscopy (TEM) and understand how they modify the electronic band structure of this material using first-principles-calculations. Our observations and calculations reveal the main types of vacancy defects, substitutional defects, and dislocation cores at the grain boundaries (GBs) of MoS2. Since the sources of defects in two-dimensional atomic layers can, in principle, be controlled and studied with more precision compared with their bulk counterparts, understanding their roles in the physical properties of this material may provide opportunities for changing their properties. Therefore, we next examine the general electronic properties of single-crystalline 2D MoS2 and study the role of GBs in the electrical transport and photoluminescence properties of its polycrystalline counterparts. These results reveal the important role played by point defects and GBs in affecting charge carrier mobility and excitonic properties of these atomic layers. In addition to the intrinsic defects, growth process induced substrate impurities and strain induced band structure perturbations are revealed as major sources of disorder in CVD grown 2D MoS2. We further explore substrate defects for modification and control of electronic and optical properties of 2D MoS2 through interface engineering. Self-assembled monolayer based interface modification, as a versatile technique adaptable to different conventional and flexible substrates, is used to promote significant tunability in the key MoS2 field-effect device parameters. This approach provides a powerful tool for modification of native substrate defect characteristics and allows for a wide range of property modulations. Our results signify the role of intrinsic and extrinsic defects in the physical properties of MoS2 and unveil strategies that can utilize these characteristics.

摘要

概述

二维(2D)二硫化钼(MoS2)独特的物理性质及其在未来光电子学中的应用前景,促使人们对其物理性质进行了广泛的研究。然而,在研究 2D MoS2 时,一个主要的限制因素是其大面积和高质量的制备。MoS2 中存在各种类型的缺陷,这使得对缺陷类型的表征以及了解它们在该材料物理性质中的作用变得至关重要。在本综述中,我们回顾了用于制备 2D MoS2 的合成方法的发展以及对缺陷在其电子和光学性质中作用的理解。我们首先研究了我们在理解剥离、直接硫化和化学气相沉积(CVD)单层 MoS2 方面的研究进展,这些方法是制备这种原子层的主要方法。我们认识到,这些合成方法的一个自然结果是增加了缺陷的来源,因此我们最初专注于识别 CVD MoS2 中具有本征和外禀起源的这些不完美之处。我们使用透射电子显微镜(TEM)揭示了多晶 MoS2 晶体结构中主要的点缺陷和晶界缺陷类型,并使用第一性原理计算理解了它们如何改变该材料的电子能带结构。我们的观察和计算揭示了 MoS2 中空位缺陷、替代缺陷和晶界(GBs)位错核的主要类型。由于二维原子层中的缺陷源原则上可以比其体相 counterparts 更精确地控制和研究,因此了解它们在该材料物理性质中的作用可能为改变其性质提供机会。因此,我们接下来研究了单晶 2D MoS2 的一般电子性质,并研究了 GBs 在其多晶对应物的电输运和光致发光性质中的作用。这些结果揭示了点缺陷和 GBs 在影响这些原子层中的电荷载流子迁移率和激子性质方面的重要作用。除了本征缺陷外,生长过程中诱导的衬底杂质和应变诱导的能带结构扰动被揭示为 CVD 生长的 2D MoS2 中主要的无序源。我们通过界面工程进一步探索了衬底缺陷对 2D MoS2 电子和光学性质的修饰和控制。基于自组装单层的界面修饰作为一种通用技术,适用于不同的传统和柔性衬底,可显著调节关键的 MoS2 场效应器件参数。这种方法为修饰本征衬底缺陷特征提供了一个强大的工具,并允许进行广泛的性能调制。我们的结果表明了内在和外在缺陷在 MoS2 物理性质中的作用,并揭示了可以利用这些特性的策略。

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