Kim Jae Myung, Lee Su Yong, Kang Hyon Chol, Noh Do Young
Department of Physics and Photon Science and School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Korea.
Pohang Light Source, Pohang Accelerator Laboratory, Pohang 790-834, Korea.
J Synchrotron Radiat. 2015 Jan;22(1):156-60. doi: 10.1107/S1600577514023534. Epub 2015 Jan 1.
The morphological change of silver nano-particles (AgNPs) exposed to an intense synchrotron X-ray beam was investigated for the purpose of direct nano-scale patterning of metal thin films. AgNPs irradiated by hard X-rays in oxygen ambient were oxidized and migrated out of the illuminated region. The observed X-ray induced oxidation was utilized to fabricate nano-scale metal line patterns using sectioned WSi2/Si multilayers as masks. Lines with a width as small as 21 nm were successfully fabricated on Ag films on silicon nitride. Au/Ag nano-lines were also fabricated using the proposed method.
为了实现金属薄膜的直接纳米级图案化，研究了暴露于强同步加速器X射线束下的银纳米颗粒（AgNPs）的形态变化。在氧气环境中用硬X射线辐照的AgNPs被氧化并迁移出光照区域。利用观察到的X射线诱导氧化，以分段的WSi2/Si多层膜为掩膜制备纳米级金属线图案。在氮化硅上的Ag膜上成功制备了宽度小至21nm的线。还使用所提出的方法制备了Au/Ag纳米线。
