Malfatti Luca, Pinna Alessandra, Enzo Stefano, Falcaro Paolo, Marmiroli Benedetta, Innocenzi Plinio
Laboratorio di Scienza dei Materiali e Nanotecnologie, CR-INSTM, Università di Sassari, Palazzo Pou Salit, Piazza Duomo 6, 07041 Alghero (SS), Italy.
Dipartimento di Chimica e Farmacia, Università di Sassari, Local INSTM Unit, Via Vienna 2, 07100 Sassari, Italy.
J Synchrotron Radiat. 2015 Jan;22(1):165-71. doi: 10.1107/S1600577514024047. Epub 2015 Jan 1.
An innovative approach towards the physico-chemical tailoring of zinc oxide thin films is reported. The films have been deposited by liquid phase using the sol-gel method and then exposed to hard X-rays, provided by a synchrotron storage ring, for lithography. The use of surfactant and chelating agents in the sol allows easy-to-pattern films made by an organic-inorganic matrix to be deposited. The exposure to hard X-rays strongly affects the nucleation and growth of crystalline ZnO, triggering the formation of two intermediate phases before obtaining a wurtzite-like structure. At the same time, X-ray lithography allows for a fast patterning of the coatings enabling microfabrication for sensing and arrays technology.
报道了一种对氧化锌薄膜进行物理化学剪裁的创新方法。这些薄膜通过溶胶 - 凝胶法采用液相沉积，然后暴露于由同步加速器储存环提供的硬X射线下进行光刻。在溶胶中使用表面活性剂和螯合剂能够沉积由有机 - 无机基质制成的易于图案化的薄膜。暴露于硬X射线下会强烈影响结晶ZnO的成核和生长，在获得纤锌矿状结构之前引发两个中间相的形成。同时，X射线光刻能够对涂层进行快速图案化，从而实现用于传感和阵列技术的微加工。
