Chkhalo N I, Salashchenko N N, Zorina M V
Department of Multilayer Optics, Institute for Physics of Microstructures of the Russian Academy of Sciences, GSP-105, 603950 Nizhny Novgorod, Russia.
Rev Sci Instrum. 2015 Jan;86(1):016102. doi: 10.1063/1.4905336.
A description of a stand based on atomic force microscopy (AFM) for roughness measurements of large optical components with arbitrary surfaces is given. The sample under study is mounted on a uniaxial goniometer which allows the sample to be tilted in the range of ±30°. The inclination enables the local normal along the axis of the probe to be established at any point of the surface under study. A comparison of the results of the measurement of noise and roughness of a flat quartz sample, in the range of spatial frequencies 0.025-70 μm(-1), obtained from "standard" AFM and developed versions is given. Within the experimental error, the measurement results were equivalent. Examples of applications of the stand for the study of substrates for X-ray optics are presented.
给出了一种基于原子力显微镜（AFM）的测量具有任意表面的大型光学元件粗糙度的支架的描述。被研究的样品安装在单轴测角仪上，该测角仪可使样品在±30°范围内倾斜。这种倾斜能够在被研究表面的任何点建立沿探头轴的局部法线。给出了从“标准”AFM和改进版本获得的在空间频率0.025 - 70μm⁻¹范围内的平面石英样品的噪声和粗糙度测量结果的比较。在实验误差范围内，测量结果是等效的。还给出了该支架用于研究X射线光学元件衬底的应用实例。
