用于通过侧壁扫描对微米和纳米结构进行关键尺寸测量的原子力显微镜卡尺。

Atomic force microscope caliper for critical dimension measurements of micro and nanostructures through sidewall scanning.

作者信息

Xie Hui, Hussain Danish, Yang Feng, Sun Lining

机构信息

State Key Laboratory of Robotics and Systems, Harbin Institute of Technology, 2 Yikuang, C1-507, HIT Science Park, 150080 Harbin, China.

出版信息

Ultramicroscopy. 2015 Nov;158:8-16. doi: 10.1016/j.ultramic.2015.06.007. Epub 2015 Jun 17.

DOI:10.1016/j.ultramic.2015.06.007

PMID:26103045

Abstract

A novel atomic force microscope (AFM) dual-probe caliper for critical dimension (CD) metrology has been developed. The caliper is equipped with two facing tilted optical fiber probes (OFPs) wherein each can be used independently to scan either sidewall of micro and nanostructures. The OFP tip with length up to 500 μm (aspect ratio 10:1, apex diameter ⩾10 nm) has unique features of scanning deep trenches and imaging sidewalls of relatively high steps with exclusive profiling possibilities. The caliper arms-OFPs can be accurately aligned with a well calibrated opening distance. The line width, line edge roughness, line width roughness, groove width and CD angles can be measured through serial scan of adjacent or opposite sidewalls with each probe. Capabilities of the presented AFM caliper have been validated through experimental CD measurement results of comb microstructures and AFM calibration grating TGZ3.

摘要

一种用于关键尺寸（CD）计量的新型原子力显微镜（AFM）双探针卡尺已被开发出来。该卡尺配备了两个相对倾斜的光纤探针（OFP），每个探针都可独立用于扫描微米和纳米结构的任一壁面。长度达500μm（纵横比为10:1，顶点直径⩾10nm）的OFP尖端具有扫描深沟槽以及对较高台阶的壁面进行成像的独特功能，并具备独特的轮廓测量可能性。卡尺臂 - OFP可以通过精确校准的开口距离进行精确对准。通过使用每个探针连续扫描相邻或相对的壁面，可以测量线宽、线边缘粗糙度、线宽粗糙度、沟槽宽度和CD角。所展示的AFM卡尺的性能已通过梳状微结构和AFM校准光栅TGZ3的CD测量实验结果得到验证。