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利用扫描电子显微镜-阴极发光纳米光谱原位表征半导体自由纳米棒的能带隙变形势和弹性极限。

Band-gap deformation potential and elasticity limit of semiconductor free-standing nanorods characterized in situ by scanning electron microscope-cathodoluminescence nanospectroscopy.

机构信息

†WPI Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan.

‡Faculty of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8571, Japan.

出版信息

ACS Nano. 2015 Mar 24;9(3):2989-3001. doi: 10.1021/nn507159u. Epub 2015 Feb 20.

DOI:10.1021/nn507159u
PMID:25689728
Abstract

Modern field-effect transistors or laser diodes take advantages of band-edge structures engineered by large uniaxial strain εzz, available up to an elasticity limit at a rate of band-gap deformation potential azz (= dEg/dεzz). However, contrary to aP values under hydrostatic pressure, there is no quantitative consensus on azz values under uniaxial tensile, compressive, and bending stress. This makes band-edge engineering inefficient. Here we propose SEM-cathodoluminescence nanospectroscopy under in situ nanomanipulation (Nanoprobe-CL). An apex of a c-axis-oriented free-standing ZnO nanorod (NR) is deflected by point-loading of bending stress, where local uniaxial strain (εcc = r/R) and its gradient across a NR (dεcc/dr = R(-1)) are controlled by a NR local curvature (R(-1)). The NR elasticity limit is evaluated sequentially (εcc = 0.04) from SEM observation of a NR bending deformation cycle. An electron beam is focused on several spots crossing a bent NR, and at each spot the local Eg is evaluated from near-band-edge CL emission energy. Uniaxial acc (= dEg/dεcc) is evaluated at regulated surface depth, and the impact of R(-1) on observed acc is investigated. The acc converges with -1.7 eV to the R(-1) = 0 limit, whereas it quenches with increasing R(-1), which is attributed to free-exciton drift under transversal band-gap gradient. Surface-sensitive CL measurements suggest that a discrepancy from bulk acc = -4 eV may originate from strain relaxation at the side surface under uniaxial stress. The nanoprobe-CL technique reveals an Eg(εij) response to specific strain tensor εij (i, j = x, y, z) and strain-gradient effects on a minority carrier population, enabling simulations and strain-dependent measurements of nanodevices with various structures.

摘要

现代场效应晶体管或激光二极管利用大的单轴应变 εzz 工程化的能带边缘结构,其在弹性极限内的能带隙变形势 azz(=dEg/dεzz)的速率可达。然而,与静水压力下的 aP 值相反,在单轴拉伸、压缩和弯曲应力下,并没有关于 azz 值的定量共识。这使得能带边缘工程效率低下。在这里,我们提出了原位纳米操纵下的扫描电子显微镜 - 阴极荧光纳米光谱学(Nanoprobe-CL)。在单轴取向的自由-standing ZnO 纳米棒(NR)的尖端通过弯曲应力的点加载进行偏折,其中局部单轴应变(εcc=r/R)及其在 NR 上的梯度(dεcc/dr=R(-1))由 NR 的局部曲率(R(-1))控制。通过 SEM 观察 NR 弯曲变形周期,依次评估 NR 的弹性极限(εcc=0.04)。电子束聚焦在跨越弯曲 NR 的几个点上,并且在每个点处,从近带边缘 CL 发射能量评估局部 Eg。在受调节的表面深度处评估单轴 acc(dEg/dεcc),并研究 R(-1) 对观察到的 acc 的影响。acc 收敛于 -1.7 eV,与 R(-1)=0 极限,而它随着 R(-1)的增加而猝灭,这归因于横向能带隙梯度下的自由激子漂移。表面敏感的 CL 测量表明,与 bulk acc=-4 eV 的差异可能源自单轴应力下的侧表面应变弛豫。纳米探针 CL 技术揭示了 Eg(εij)对特定应变张量 εij(i,j=x,y,z)和应变梯度对少数载流子群体的响应,从而能够模拟和测量具有各种结构的纳米器件的应变依赖性。

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