Pitanti Alessandro, Fink Johannes M, Safavi-Naeini Amir H, Hill Jeff T, Lei Chan U, Tredicucci Alessandro, Painter Oskar
Opt Express. 2015 Feb 9;23(3):3196-208. doi: 10.1364/OE.23.003196.
We fabricate and characterize a microscale silicon opto-electromechanical system whose mechanical motion is coupled capacitively to an electrical circuit and optically via radiation pressure to a photonic crystal cavity. To achieve large electromechanical interaction strength, we implement an inverse shadow mask fabrication scheme which obtains capacitor gaps as small as 30 nm while maintaining a silicon surface quality necessary for minimizing optical loss. Using the sensitive optical read-out of the photonic crystal cavity, we characterize the linear and nonlinear capacitive coupling to the fundamental ω(m)/2π = 63 MHz in-plane flexural motion of the structure, showing that the large electromechanical coupling in such devices may be suitable for realizing efficient microwave-to-optical signal conversion.
我们制造并表征了一种微尺度硅光机电系统，其机械运动通过电容耦合到电路，并通过辐射压力与光子晶体腔进行光学耦合。为了实现较大的机电相互作用强度，我们采用了一种反向阴影掩模制造方案，该方案可获得小至30纳米的电容器间隙，同时保持最小化光学损耗所需的硅表面质量。利用光子晶体腔的灵敏光学读出，我们表征了与结构的基频ω(m)/2π = 63兆赫兹面内弯曲运动的线性和非线性电容耦合，表明此类器件中的大机电耦合可能适用于实现高效的微波到光信号转换。
