Wu Zhouwei, Uchi Hiroshi, Morino-Koga Saori, Shi Weimin, Furue Masutaka
Department of Dermatology, Shanghai First People's Hospital, Shanghai Jiaotong University, Shanghai, China.
Department of Dermatology, Graduate School of Medical Sciences, Kyushu University, Fukuoka, Japan.
Exp Dermatol. 2015 Sep;24(9):703-8. doi: 10.1111/exd.12758. Epub 2015 Jul 14.
Ultraviolet B (UVB), a harmful environmental factor, is responsible for a variety of skin disorders including skin inflammation through reactive oxygen species (ROS) and inflammatory mediator production. Here, we investigated the effect of Z-ligustilide (Z-lig), an active ingredient isolated from the medicinal plants Cnidium officinale and Angelica acutiloba, on UVB-induced ROS generation and inflammatory mediator production in normal human epidermal keratinocytes (NHEKs) as well as its underlying mechanisms. Z-lig significantly rescued UVB-induced NHEKs damage in a dosage-dependent manner. Pretreatment of NHEKs with Z-lig inhibited UVB-induced ROS production in NHEKs. Both silencing the nuclear factor E2-related factor 2 (Nrf2) and the supplement of tin protoporphyrin IX (SnPP), a haeme oxygenase-1 (HO-1) inhibitor, cancelled the inhibitory effect of Z-lig on UVB-induced ROS upregulation in NHEKs. Moreover, pretreatment of NHEKs with Z-lig reduced UVB-induced nuclear factor kappa B (NF-κB)-dependent inflammatory mediators (IL-6, IL-8 and MCP-1) production at both mRNA and protein level. In the presence of Z-lig, UVB-induced NF-κB subunit p65 nuclear translocation was abolished, and the IκBα degradation was suppressed. Taken together, these findings suggest that Z-lig can suppress UVB-induced ROS generation through Nrf2/HO-1 upregulation and inflammation by suppressing the NF-κB pathway, suggesting that Z-lig may be beneficial in protecting skin from UVB exposure.
紫外线B(UVB)是一种有害的环境因素,它通过活性氧(ROS)和炎症介质的产生导致包括皮肤炎症在内的多种皮肤疾病。在此,我们研究了从药用植物蛇床子和当归中分离出的活性成分Z-藁本内酯(Z-lig)对正常人表皮角质形成细胞(NHEK)中UVB诱导的ROS生成和炎症介质产生的影响及其潜在机制。Z-lig以剂量依赖的方式显著挽救了UVB诱导的NHEK损伤。用Z-lig预处理NHEK可抑制UVB诱导的NHEK中ROS的产生。沉默核因子E2相关因子2(Nrf2)以及补充血红素加氧酶-1(HO-1)抑制剂锡原卟啉IX(SnPP)均消除了Z-lig对UVB诱导的NHEK中ROS上调的抑制作用。此外,用Z-lig预处理NHEK可在mRNA和蛋白质水平上降低UVB诱导的核因子κB(NF-κB)依赖性炎症介质(IL-6、IL-8和MCP-1)的产生。在存在Z-lig的情况下,UVB诱导的NF-κB亚基p65核转位被消除,IκBα降解受到抑制。综上所述,这些发现表明Z-lig可通过上调Nrf2/HO-1抑制UVB诱导的ROS生成,并通过抑制NF-κB途径减轻炎症,这表明Z-lig可能有助于保护皮肤免受UVB照射。