Institute for Advanced Materials, Jiangsu University, Jiangsu, 212013, China.
Nanoscale Res Lett. 2015 Dec;10(1):1022. doi: 10.1186/s11671-015-1022-0. Epub 2015 Aug 6.
The double-sided transparent conductive films of AgNWs/PVC/AgNWs using the silver nanowires and PVC substrate were fabricated by the dip-coating process followed by mechanical press treatment. The morphological and structural characteristics were investigated by scanning electron microscope (SEM) and atomic force microscope (AFM), the photoelectric properties and mechanical stability were measured by ultraviolet-visible spectroscopy (UV-vis) spectrophotometer, four-point probe technique, 3M sticky tape test, and cyclic bending test. The results indicate that the structure and photoelectric performances of the AgNWs films were mainly affected by the dipping and lifting speeds. At the optimized dipping speed of 50 mm/min and lifting speed of 100 mm/min, the AgNWs are evenly distributed on the surface of the PVC substrate, and the sheet resistance of AgNWs film on both sides of PVC is about 60 Ω/sq, and the optical transmittance is 84.55 % with the figure of merit value up to 35.8. The film treated with the 10 MPa pressure shows excellent adhesion and low surface roughness of 17.8 nm and maintains its conductivity with the sheet resistance change of 17 % over 10,000 cyclic bends.
采用银纳米线和聚氯乙烯(PVC)基底,通过浸涂工艺和机械压延处理制备了双面透明导电膜 AgNWs/PVC/AgNWs。通过扫描电子显微镜(SEM)和原子力显微镜(AFM)研究了其形态和结构特征,通过紫外-可见分光光度计(UV-vis)、四点探针技术、3M 胶带测试和循环弯曲测试测量了光电性能和机械稳定性。结果表明,AgNWs 薄膜的结构和光电性能主要受浸渍和提升速度的影响。在优化的浸渍速度为 50mm/min 和提升速度为 100mm/min 下,AgNWs 均匀分布在 PVC 基底表面,两侧 AgNWs 薄膜的方阻约为 60Ω/sq,光学透过率为 84.55%,品质因数高达 35.8。在 10MPa 压力下处理的薄膜表现出优异的附着力和低表面粗糙度(17.8nm),并且在经过 10,000 次循环弯曲后,其方阻变化仅为 17%,保持其导电性。