Azam Md Shafiul, Weeraman Champika N, Gibbs-Davis Julianne M
Department of Chemistry, University of Alberta, Edmonton, Alberta, Canada.
J Phys Chem Lett. 2012 May 17;3(10):1269-74. doi: 10.1021/jz300255x. Epub 2012 Apr 30.
Using nonresonant second harmonic generation spectroscopy, we have monitored the change in surface charge density of the silica/water interface over a broad pH range in the presence of different alkali chlorides. Planar silica is known to possess two types of surface sites with pKa values of ∼4 and ∼9, which are attributed to different solvation environments of the silanols. We report that varying the alkali chloride electrolyte significantly changes the effective acid dissociation constant (pKa(eff)) for the less acidic silanol groups, with the silica/NaClaq and silica/CsClaq interfaces exhibiting the lowest and highest pKa(eff) values of 8.3(1) and 10.8(1), respectively. Additionally, the relative populations of the two silanol groups are also very sensitive to the electrolyte identity. The greatest percentage of acidic silanol groups was 60(2)% for the silica/LiClaq interface in contrast to the lowest value of 20(2)% for the silica/NaClaq interface. We attribute these changes in the bimodal behavior to the influence of alkali ions on the interfacial water structure and its corresponding effect on surface acidity.
利用非共振二次谐波产生光谱,我们监测了在不同碱金属氯化物存在下,二氧化硅/水界面在较宽pH范围内表面电荷密度的变化。已知平面二氧化硅具有两种类型的表面位点,其pKa值分别约为4和9,这归因于硅醇的不同溶剂化环境。我们报告称,改变碱金属氯化物电解质会显著改变酸性较弱的硅醇基团的有效酸解离常数(pKa(eff)),二氧化硅/氯化钠水溶液和二氧化硅/氯化铯水溶液界面的pKa(eff)值分别为8.3(1)和10.8(1),呈现出最低和最高值。此外,两种硅醇基团的相对数量对电解质种类也非常敏感。二氧化硅/氯化锂水溶液界面的酸性硅醇基团比例最高,为60(2)%,而二氧化硅/氯化钠水溶液界面的该比例最低,为20(2)%。我们将这种双峰行为的变化归因于碱金属离子对界面水结构的影响及其对表面酸度的相应作用。