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黑磷中的功耗和电击穿。

Power Dissipation and Electrical Breakdown in Black Phosphorus.

机构信息

IBM Research, Yorktown Heights, New York 10598, United States.

IBM Research, Rio de Janeiro, RJ 22290-240, Brazil.

出版信息

Nano Lett. 2015 Oct 14;15(10):6785-8. doi: 10.1021/acs.nanolett.5b02622. Epub 2015 Sep 10.

Abstract

We report operating temperatures and heating coefficients measured in a multilayer black phosphorus device as a function of injected electrical power. By combining micro-Raman spectroscopy and electrical transport measurements, we have observed a linear temperature increase up to 600 K at a power dissipation rate of 0.896 K μm(3)/mW. By further increasing the bias voltage, we determined the threshold power and temperature for electrical breakdown and analyzed the fracture in the black phosphorus layer that caused the device failure by means of scanning electron microscopy and atomic force microscopy. The results will benefit the research and development of electronics and optoelectronics based on novel two-dimensional materials.

摘要

我们报告了在注入电功率的函数中测量到的多层黑磷器件的工作温度和加热系数。通过结合微拉曼光谱和电输运测量,我们观察到在功率耗散率为 0.896 K μm(3)/mW 时,温度线性增加到 600 K。通过进一步增加偏置电压,我们确定了电击穿的阈值功率和温度,并通过扫描电子显微镜和原子力显微镜分析了导致器件失效的黑磷层的断裂。这些结果将有益于基于新型二维材料的电子学和光电子学的研究和开发。

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Power Dissipation and Electrical Breakdown in Black Phosphorus.黑磷中的功耗和电击穿。
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