Benedikovic Daniel, Cheben Pavel, Schmid Jens H, Xu Dan-Xia, Lamontagne Boris, Wang Shurui, Lapointe Jean, Halir Robert, Ortega-Moñux Alejandro, Janz Siegfried, Dado Milan
Opt Express. 2015 Aug 24;23(17):22628-35. doi: 10.1364/OE.23.022628.
Surface grating couplers are fundamental components in chip-based photonic devices to couple light between photonic integrated circuits and optical fibers. In this work, we report on a grating coupler with sub-decibel experimental coupling efficiency using a single etch process in a standard 220-nm silicon-on-insulator (SOI) platform. We specifically demonstrate a subwavelength metamaterial refractive index engineered nanostructure with backside metal reflector, with the measured peak fiber-chip coupling efficiency of -0.69 dB (85.3%) and 3 dB bandwidth of 60 nm. This is the highest coupling efficiency hitherto experimentally achieved for a surface grating coupler implemented in 220-nm SOI platform.
表面光栅耦合器是基于芯片的光子器件中的基本组件,用于在光子集成电路和光纤之间耦合光。在这项工作中,我们报道了一种在标准220纳米绝缘体上硅(SOI)平台中使用单一蚀刻工艺的、实验耦合效率低于1分贝的光栅耦合器。我们特别展示了一种具有背面金属反射器的亚波长超材料折射率工程纳米结构,其测量的峰值光纤-芯片耦合效率为-0.69分贝(85.3%),3分贝带宽为60纳米。这是迄今为止在220纳米SOI平台上实现的表面光栅耦合器实验所达到的最高耦合效率。