多孔石墨烯作为分子的杂草阻隔物。

Holey Graphene as a Weed Barrier for Molecules.

机构信息

Materials and Process Simulation Center and ‡Department of Biological Engineering, California Institute of Technology , Pasadena, California 91125, United States.

Department of Chemistry and Biochemistry and California NanoSystems Institute and ⊥Department of Materials Science and Engineering, University of California , Los Angeles, Los Angeles, California 90095, United States.

出版信息

ACS Nano. 2015 Nov 24;9(11):10909-15. doi: 10.1021/acsnano.5b03936. Epub 2015 Oct 6.

DOI:10.1021/acsnano.5b03936

PMID:26426746

Abstract

We demonstrate the use of "holey" graphene as a mask against molecular adsorption. Prepared porous graphene is transferred onto a Au{111} substrate, annealed, and then exposed to dilute solutions of 1-adamantanethiol. In the pores of the graphene lattice, we find islands of organized, self-assembled molecules. The bare Au in the pores can be regenerated by postdeposition annealing, and new molecules can be self-assembled in the exposed Au region. Graphene can serve as a robust, patternable mask against the deposition of self-assembled monolayers.

摘要

我们展示了“有孔”石墨烯作为阻挡分子吸附的掩膜的用途。制备的多孔石墨烯转移到 Au{111}基底上，进行退火处理，然后暴露于 1-金刚烷硫醇的稀溶液中。在石墨烯晶格的孔中，我们发现了有序自组装分子的岛。孔中裸露的 Au 可以通过后沉积退火再生，并且可以在暴露的 Au 区域中自组装新的分子。石墨烯可用作阻挡自组装单层沉积的坚固、可图案化掩膜。