Jana Debanjan, Chakrabarti Somsubhra, Rahaman Sheikh Ziaur, Maikap Siddheswar
Thin Film Nano Technology Laboratory, Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Rd., Kwei-Shan, Tao-Yuan, 333, Taiwan.
Nanoscale Res Lett. 2015 Dec;10(1):392. doi: 10.1186/s11671-015-1090-1. Epub 2015 Oct 7.
It is known that conductive-bridge resistive-random-access-memory (CBRAM) device is very important for future high-density nonvolatile memory as well as logic application. Even though the CBRAM devices using different materials, structures, and switching performance have been reported in Nanoscale Res. Lett., 2015, however, optical switching characteristics by using thermally grown Ge0.2Se0.8 film in Cu/GeSex/W structure are reported for the first time in this study. The Cu/GeSex/W memory devices have low current compliances (CCs) ranging from 1 nA to 500 μA with low voltage of ±1.2 V, high resistance ratio of approximately 10(3), stable endurance of >200 cycles, and good data retention of >7 × 10(3) s at 85 °C. Multi-steps of RESET phenomena and evolution of Cu filaments' shape under CCs ranging from 1 nA to 500 μA have been discussed. Under external white-light illumination with an intensity of 2.68 mW/cm(2) (wavelength ranges from 390 to 700 nm), memory device shows optical switching with long read pulse endurance of >10(5) cycles. This CBRAM device has optically programmed and electrically erased, which can open up a new area of research field for future application.
众所周知,导电桥随机存取存储器(CBRAM)器件对于未来的高密度非易失性存储器以及逻辑应用非常重要。尽管在《纳米尺度研究快报》2015年报道了使用不同材料、结构和开关性能的CBRAM器件,然而,本研究首次报道了在Cu/GeSex/W结构中使用热生长的Ge0.2Se0.8薄膜的光学开关特性。Cu/GeSex/W存储器件具有低电流顺应性(CCs),范围从1 nA到500 μA,低电压为±1.2 V,高电阻比约为10(3),稳定耐久性>200次循环,在85°C下具有>7×10(3) s的良好数据保持性。讨论了在1 nA到500 μA的CCs下复位现象的多步过程以及铜丝形状的演变。在强度为2.68 mW/cm(2)(波长范围从390到700 nm)的外部白光照射下,存储器件显示出具有>10(5)次循环的长读取脉冲耐久性的光学开关。这种CBRAM器件具有光学编程和电擦除功能,可为未来应用开辟新的研究领域。