Xu Xiangru, Huang Wei, Xu Mingfei
Opt Express. 2015 Oct 19;23(21):27911-9. doi: 10.1364/OE.23.027911.
Optical lithography has approached a regime of high numerical aperture and wide field, where the impact of polarization aberration on imaging quality turns to be serious. Most of the existing studies focused on the distribution rule of polarization aberration on the pupil, and little attention had been paid to the field. In this paper, a new orthonormal set of polynomials is established to describe the polarization aberration of rotationally symmetric optical systems. The polynomials can simultaneously reveal the distribution rules of polarization aberration on the exit pupil and the field. Two examples are given to verify the polynomials.
光学光刻已进入高数值孔径和宽视场的领域，其中偏振像差对成像质量的影响变得严重。现有的大多数研究都集中在偏振像差在光瞳上的分布规律，而很少关注视场。本文建立了一组新的正交多项式来描述旋转对称光学系统的偏振像差。这些多项式可以同时揭示出偏振像差在出射光瞳和视场上的分布规律。给出了两个例子来验证这些多项式。
