Zhou Wang, Yoo H M, Prabhu-Gaunkar S, Tiemann L, Reichl C, Wegscheider W, Grayson M
Electrical Engineering and Computer Science, Northwestern University, Evanston, Illinois 60208, USA.
Laboratory for Solid State Physics, ETH Zürich, 8093 Zürich, Switzerland.
Phys Rev Lett. 2015 Oct 30;115(18):186804. doi: 10.1103/PhysRevLett.115.186804. Epub 2015 Oct 28.
A longitudinal magnetoresistance asymmetry (LMA) between a positive and negative magnetic field is known to occur in both the extreme quantum limit and the classical Drude limit in samples with a nonuniform doping density. By analyzing the current stream function in van der Pauw measurement geometry, it is shown that the electron density gradient can be quantitatively deduced from this LMA in the Drude regime. Results agree with gradients interpolated from local densities calibrated across an entire wafer, establishing a generalization of the van der Pauw method to quantify density gradients.
在具有非均匀掺杂密度的样品中,已知在极量子极限和经典德鲁德极限下,正负磁场之间都会出现纵向磁阻不对称(LMA)。通过分析范德堡测量几何结构中的电流流函数,结果表明,在德鲁德 regime 中,可以从这种 LMA 定量推导出电子密度梯度。结果与从整个晶圆校准的局部密度插值得到的梯度一致,从而建立了范德堡方法的推广,以量化密度梯度。