Alberding Brian G, Thurber W Robert, Heilweil Edwin J
Radiation Physics Division, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA.
Engineering Physics Division, National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA.
J Opt Soc Am B. 2017 Jul;34(7):1392-1406. doi: 10.1364/JOSAB.34.001392. Epub 2017 Jun 12.
Charge carrier conductivity and mobility for various semiconductor wafers and crystals were measured by ultrafast above bandgap, optically excited Time-Resolved Terahertz Spectroscopy (TRTS) and Hall Van der Pauw contact methods to directly compare these approaches and validate the use of the non-contact optical approach for future materials and device analyses. Undoped and doped silicon (Si) wafers with resistances varying over six orders of magnitude were selected as model systems since contact Hall measurements are reliably made on this material. Conductivity and mobility obtained at room temperature by terahertz transmission and TRTS methods yields the sum of electron and hole mobility which agree very well with either directly measured or literature values for corresponding atomic and photo-doping densities. Careful evaluation of the optically-generated TRTS frequency-dependent conductivity also shows it is dominated by induced free-carrier absorption rather than small probe pulse phase shifts, which is commonly ascribed to changes in the complex conductivity from sample morphology and evaluation of carrier mobility by applying Drude scattering models. Thus, in this work, the real-valued, frequency-averaged conductivity was used to extract sample mobility without application of models. Examinations of germanium (Ge), gallium arsenide (GaAs), gallium phosphide (GaP) and zinc telluride (ZnTe) samples were also made to demonstrate the general applicability of the TRTS method, even for materials that do not reliably make good contacts (e.g., GaAs, GaP, ZnTe). For these cases, values for the sum of the electron and hole mobility also compare very favorably to measured or available published data.
通过超快带隙以上光学激发的时间分辨太赫兹光谱(TRTS)和霍尔范德堡接触法,测量了各种半导体晶圆和晶体的载流子电导率和迁移率,以直接比较这些方法,并验证非接触光学方法在未来材料和器件分析中的应用。选择电阻变化超过六个数量级的未掺杂和掺杂硅(Si)晶圆作为模型系统,因为可以在这种材料上可靠地进行接触霍尔测量。通过太赫兹传输和TRTS方法在室温下获得的电导率和迁移率给出了电子和空穴迁移率的总和,这与相应原子和光掺杂密度的直接测量值或文献值非常吻合。对光学产生的TRTS频率相关电导率的仔细评估还表明,它主要由感应自由载流子吸收主导,而不是小探针脉冲相移,后者通常归因于样品形态导致的复电导率变化以及通过应用德鲁德散射模型评估载流子迁移率。因此,在这项工作中,使用实值、频率平均电导率来提取样品迁移率,而无需应用模型。还对锗(Ge)、砷化镓(GaAs)、磷化镓(GaP)和碲化锌(ZnTe)样品进行了检测,以证明TRTS方法的普遍适用性,即使对于那些不能可靠地形成良好接触的材料(如GaAs、GaP、ZnTe)也是如此。对于这些情况,电子和空穴迁移率总和的值与测量值或已发表的可用数据相比也非常有利。