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半导体中带电缺陷补偿的自调节与形成能钉扎

Self-regulation of charged defect compensation and formation energy pinning in semiconductors.

作者信息

Yang Ji-Hui, Yin Wan-Jian, Park Ji-Sang, Wei Su-Huai

机构信息

National Renewable Energy Laboratory, Golden, CO 80401, USA.

Beijing Computational Science Research Center, Beijing, 100094, China.

出版信息

Sci Rep. 2015 Nov 20;5:16977. doi: 10.1038/srep16977.

Abstract

Current theoretical analyses of defect properties without solving the detailed balance equations often estimate Fermi-level pinning position by omitting free carriers and assume defect concentrations can be always tuned by atomic chemical potentials. This could be misleading in some circumstance. Here we clarify that: (1) Because the Fermi-level pinning is determined not only by defect states but also by free carriers from band-edge states, band-edge states should be treated explicitly in the same footing as the defect states in practice; (2) defect formation energy, thus defect density, could be pinned and independent on atomic chemical potentials due to the entanglement of atomic chemical potentials and Fermi energy, in contrast to the usual expectation that defect formation energy can always be tuned by varying the atomic chemical potentials; and (3) the charged defect compensation behavior, i.e., most of donors are compensated by acceptors or vice versa, is self-regulated when defect formation energies are pinned. The last two phenomena are more dominant in wide-gap semiconductors or when the defect formation energies are small. Using NaCl and CH3NH3PbI3 as examples, we illustrate these unexpected behaviors. Our analysis thus provides new insights that enrich the understanding of the defect physics in semiconductors and insulators.

摘要

当前,在不求解详细平衡方程的情况下对缺陷性质进行的理论分析,常常通过忽略自由载流子来估计费米能级钉扎位置,并假设缺陷浓度总能通过原子化学势来调节。这在某些情况下可能会产生误导。在此我们阐明:(1)由于费米能级钉扎不仅由缺陷态决定,还由来自带边态的自由载流子决定,因此在实际中,带边态应与缺陷态同等对待并进行明确处理;(2)与通常认为缺陷形成能总能通过改变原子化学势来调节的预期相反,由于原子化学势与费米能的纠缠,缺陷形成能,进而缺陷密度,可能会被钉扎且与原子化学势无关;(3)当缺陷形成能被钉扎时,带电缺陷补偿行为,即大多数施主被受主补偿或反之亦然,是自我调节的。后两种现象在宽带隙半导体中或缺陷形成能较小时更为显著。以氯化钠和碘化甲脒铅为例,我们说明了这些意外行为。因此,我们的分析提供了新的见解,丰富了对半导体和绝缘体中缺陷物理的理解。

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