Peng Shouzhong, Wang Mengxing, Yang Hongxin, Zeng Lang, Nan Jiang, Zhou Jiaqi, Zhang Youguang, Hallal Ali, Chshiev Mairbek, Wang Kang L, Zhang Qianfan, Zhao Weisheng
Fert Beijing Institute, Beihang University, Beijing 100191, China.
School of Electronic and Information Engineering, Beihang University, Beijing 100191, China.
Sci Rep. 2015 Dec 11;5:18173. doi: 10.1038/srep18173.
Spin-transfer-torque magnetic random access memory (STT-MRAM) attracts extensive attentions due to its non-volatility, high density and low power consumption. The core device in STT-MRAM is CoFeB/MgO-based magnetic tunnel junction (MTJ), which possesses a high tunnel magnetoresistance ratio as well as a large value of perpendicular magnetic anisotropy (PMA). It has been experimentally proven that a capping layer coating on CoFeB layer is essential to obtain a strong PMA. However, the physical mechanism of such effect remains unclear. In this paper, we investigate the origin of the PMA in MgO/CoFe/metallic capping layer structures by using a first-principles computation scheme. The trend of PMA variation with different capping materials agrees well with experimental results. We find that interfacial PMA in the three-layer structures comes from both the MgO/CoFe and CoFe/capping layer interfaces, which can be analyzed separately. Furthermore, the PMAs in the CoFe/capping layer interfaces are analyzed through resolving the magnetic anisotropy energy by layer and orbital. The variation of PMA with different capping materials is attributed to the different hybridizations of both d and p orbitals via spin-orbit coupling. This work can significantly benefit the research and development of nanoscale STT-MRAM.
自旋转移矩磁随机存取存储器(STT-MRAM)因其非易失性、高密度和低功耗而备受关注。STT-MRAM的核心器件是基于CoFeB/MgO的磁性隧道结(MTJ),它具有高隧道磁电阻比以及较大的垂直磁各向异性(PMA)值。实验证明,在CoFeB层上涂覆盖帽层对于获得强PMA至关重要。然而,这种效应的物理机制仍不清楚。在本文中,我们使用第一性原理计算方案研究了MgO/CoFe/金属盖帽层结构中PMA的起源。PMA随不同盖帽材料的变化趋势与实验结果吻合良好。我们发现三层结构中的界面PMA来自MgO/CoFe和CoFe/盖帽层界面,这可以分别进行分析。此外,通过按层和轨道解析磁各向异性能量来分析CoFe/盖帽层界面中的PMA。PMA随不同盖帽材料的变化归因于通过自旋轨道耦合d轨道和p轨道的不同杂化。这项工作对纳米级STT-MRAM的研发具有重要意义。