Papanai Girija Shankar, Sahoo Krishna Rani, Reshma G Betsy, Gupta Sarika, Gupta Bipin Kumar
Photonic Materials Metrology Sub Division, Advanced Materials and Device Metrology Division, CSIR-National Physical Laboratory Dr K. S. Krishnan Marg New Delhi 110012 India
Academy of Scientific and Innovative Research (AcSIR) Ghaziabad 201002 India.
RSC Adv. 2022 May 4;12(21):13428-13439. doi: 10.1039/d2ra00387b. eCollection 2022 Apr 28.
The quality of as-synthesized monolayers plays a significant role in atomically thin semiconducting transition metal dichalcogenides (TMDCs) to determine the electronic and optical properties. For designing optoelectronic devices, exploring the effect of processing parameters on optical properties is a prerequisite. In this view, we present the influence of processing parameters on the lattice and quasiparticle dynamics of monolayer MoSe. The lab-built chemical vapour deposition (CVD) setup is used to synthesize monolayer MoSe flakes with varying shapes, including sharp triangle (ST), truncated triangle (TT), hexagon, and rough edge circle (REC). In particular, the features of as-synthesized monolayer MoSe flakes are examined using Raman and photoluminescence (PL) spectroscopy. Raman spectra reveal that the frequency difference between the A and E peaks is >45 cm in all the monolayer samples. PL spectroscopy also shows that the synthesized MoSe flakes are monolayer in nature with a direct band gap in the range of 1.50-1.58 eV. Furthermore, the variation in the direct band gap is analyzed using the spectral weight of quasiparticles in PL emission, where the intensity ratio {(A)/(A)} and trion binding energy are found to be ∼1.1-5.0 and ∼23.1-47.5 meV in different monolayer MoSe samples. Hence, these observations manifest that the processing parameters make a substantial contribution in tuning the vibrational and excitonic properties.
合成单分子层的质量在原子级薄的半导体过渡金属二硫属化物(TMDCs)中对确定其电子和光学性质起着重要作用。对于设计光电器件而言,探索加工参数对光学性质的影响是一个先决条件。基于此观点,我们展示了加工参数对单层MoSe晶格和准粒子动力学的影响。实验室搭建的化学气相沉积(CVD)装置用于合成具有不同形状的单层MoSe薄片,包括尖锐三角形(ST)、截顶三角形(TT)、六边形和粗糙边缘圆形(REC)。特别地,使用拉曼光谱和光致发光(PL)光谱对合成的单层MoSe薄片的特征进行了研究。拉曼光谱表明,在所有单层样品中,A峰和E峰之间的频率差大于45 cm。PL光谱还表明,合成的MoSe薄片本质上是单层的,直接带隙在1.50 - 1.58 eV范围内。此外,利用PL发射中准粒子的光谱权重分析了直接带隙的变化,发现在不同的单层MoSe样品中,强度比{(A)/(A)}和三重子结合能分别约为1.1 - 5.0和23.1 - 47.5 meV。因此,这些观察结果表明加工参数在调节振动和激子性质方面做出了重大贡献。