Jiang Teng, Xu Sheng-Rui, Zhang Jin-Cheng, Xie Yong, Hao Yue
Wide Bandap Semiconductor Technology Disciplines State Key Laboratory, School of Microelectronics, Xidian University, Xi'an 710071, China.
School of Advanced Materials and Nanotechnology, Xidian University, Xi'an 710071, China.
Sci Rep. 2016 Jan 29;6:19955. doi: 10.1038/srep19955.
Uncoalesced a-plane GaN epitaxial lateral overgrowth (ELO) structures have been synthesized along two mask stripe orientations on a-plane GaN template by MOCVD. The morphology of two ELO GaN structures is performed by Scanning electronic microscopy. The anisotropy of crystalline quality and stress are investigated by micro-Raman spectroscopy. According to the Raman mapping spectra, the variations on the intensity, peak shift and the full width at half maximum (FWHM) of GaN E2 (high) peak indicate that the crystalline quality improvement occurs in the window region of the GaN stripes along [0001], which is caused by the dislocations bending towards the sidewalls. Conversely, the wing regions have better quality with less stress as the dislocations propagated upwards when the GaN stripes are along []. Spatial cathodoluminescence mapping results further support the explanation for the different dislocation growth mechanisms in the ELO processes with two different mask stripe orientations.
通过金属有机化学气相沉积(MOCVD)在a面GaN模板上沿两个掩膜条纹取向合成了未合并的a面GaN外延横向生长(ELO)结构。通过扫描电子显微镜对两种ELO GaN结构的形貌进行了表征。利用显微拉曼光谱研究了晶体质量和应力的各向异性。根据拉曼映射光谱,GaN E2(高)峰的强度、峰位移动和半高宽(FWHM)的变化表明,沿[0001]方向的GaN条纹窗口区域的晶体质量得到改善,这是由位错向侧壁弯曲引起的。相反,当GaN条纹沿[]方向时,随着位错向上传播,翼区具有更好的质量和更小的应力。空间阴极发光映射结果进一步支持了对两种不同掩膜条纹取向的ELO过程中不同位错生长机制的解释。