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铋硫族化合物拓扑绝缘体纳米结构高指数表面上的狄拉克费米子。

Dirac fermions at high-index surfaces of bismuth chalcogenide topological insulator nanostructures.

作者信息

Virk Naunidh, Yazyev Oleg V

机构信息

Institute of Theoretical Physics, Ecole Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.

出版信息

Sci Rep. 2016 Feb 5;6:20220. doi: 10.1038/srep20220.

Abstract

Binary bismuth chalcogenides Bi2Se3, Bi2Te3, and related materials are currently being extensively investigated as the reference topological insulators (TIs) due to their simple surface-state band dispersion (single Dirac cone) and relatively large bulk band gaps. Nanostructures of TIs are of particular interest as an increased surface-to-volume ratio enhances the contribution of surfaces states, meaning they are promising candidates for potential device applications. So far, the vast majority of research efforts have focused on the low-energy (0001) surfaces, which correspond to natural cleavage planes in these layered materials. However, the surfaces of low-dimensional nanostructures (nanoplatelets, nanowires, nanoribbons) inevitably involve higher-index facets. We perform a systematic ab initio investigation of the surfaces of bismuth chalcogenide TI nanostructures characterized by different crystallographic orientations, atomic structures and stoichiometric compositions. We find several stable terminations of high-index surfaces, which can be realized at different values of the chemical potential of one of the constituent elements. For the uniquely defined stoichiometric termination, the topological Dirac fermion states are shown to be strongly anisotropic with a clear dependence of Fermi velocities and spin polarization on the surface orientation. Self-doping effects and the presence of topologically trivial mid-gap states are found to characterize the non-stoichiometric surfaces. The results of our study pave the way towards experimental control of topologically protected surface states in bismuth chalcogenide nanostructures.

摘要

二元硫族铋化物Bi2Se3、Bi2Te3及相关材料,因其简单的表面态能带色散(单个狄拉克锥)和相对较大的体能带隙,目前正作为参考拓扑绝缘体(TI)被广泛研究。TI的纳米结构特别受关注,因为增加的表面积与体积之比增强了表面态的贡献,这意味着它们是潜在器件应用的有前途的候选者。到目前为止,绝大多数研究工作都集中在低能(0001)表面,这些表面对应于这些层状材料中的自然解理面。然而,低维纳米结构(纳米片、纳米线、纳米带)的表面不可避免地涉及更高指数的晶面。我们对具有不同晶体取向、原子结构和化学计量组成的硫族铋化物TI纳米结构的表面进行了系统的从头算研究。我们发现了几种高指数表面的稳定终止结构,它们可以在其中一种组成元素的不同化学势值下实现。对于唯一确定的化学计量终止结构,拓扑狄拉克费米子态表现出强烈的各向异性,费米速度和自旋极化明显依赖于表面取向。发现自掺杂效应和拓扑平凡的带隙中间态的存在是非化学计量表面的特征。我们的研究结果为硫族铋化物纳米结构中拓扑保护表面态的实验控制铺平了道路。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/559a/4742872/fa41b7466a01/srep20220-f1.jpg

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